| Presentation | 1998/5/22 Slective etching of native oxide by remote-plasma-excited anhydrous HF Hirofumi Yamazaki, Masamitsu Ogasawara, Yutaka Nakazawa, Yoji Saito, |
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| PDF Download Page | PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | With the trend toward down-scaling of a device size in the integrated circuits, the etching technique of the native oxide becomes important. In this study, we demonstrate etching reaction between the silicon native oxide and anhydrous hydrogen fluoride (AHF) gas with remote-plasma-excite Ar gas. We attempt to improve the selectivity of the oxide etching with respect to silicon by introducing hydrogen into the system. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | native oxide / anhydrous hydrogen floride / dry etching / remote-plasma |
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| Committee | ED |
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| Conference Date | 1998/5/22(1days) |
| Place (in Japanese) | (See Japanese page) |
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| Topics (in Japanese) | (See Japanese page) |
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| Registration To | Electron Devices (ED) |
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| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Slective etching of native oxide by remote-plasma-excited anhydrous HF |
| Sub Title (in English) | |
| Keyword(1) | native oxide |
| Keyword(2) | anhydrous hydrogen floride |
| Keyword(3) | dry etching |
| Keyword(4) | remote-plasma |
| 1st Author's Name | Hirofumi Yamazaki |
| 1st Author's Affiliation | Department of Electric Engineering and Electronics, Faculty of Engineering, Seikei University() |
| 2nd Author's Name | Masamitsu Ogasawara |
| 2nd Author's Affiliation | Department of Electric Engineering and Electronics, Faculty of Engineering, Seikei University |
| 3rd Author's Name | Yutaka Nakazawa |
| 3rd Author's Affiliation | Department of Electric Engineering and Electronics, Faculty of Engineering, Seikei University |
| 4th Author's Name | Yoji Saito |
| 4th Author's Affiliation | Department of Electric Engineering and Electronics, Faculty of Engineering, Seikei University |
| Date | 1998/5/22 |
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| Volume (vol) | vol.98 |
| Number (no) | 60 |
| Page | pp.pp.- |
| #Pages | 6 |
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