Presentation 1998/5/22
H plasma passivation of MOCVD grown GaAs-on-Si
Gang Wang, Tetsuo Soga, Takashi Jimbo, Masayoshi Umeno,
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Abstract(in English) The effects of plasma hydrogenation on the optical and electrical properties for GaAs-on-Si epitaxial layers characterized by I-V, PL, and DLTS methods. The hydrogenation provides a significant improvement of the PL properties. The deep level which is related to Si-defect complex was completely passivated, and the effect of the deep level passivation was still retained after annealing at 400℃ for 10 min. This suggests that the hydrogenation may be used to improve the properties of GaAs-on-Si devices.
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Keyword(in English) GaAs-on Si / H plasma / passivation / C-V / PL / DLTS
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Conference Date 1998/5/22(1days)
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Language JPN
Title (in Japanese) (See Japanese page)
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Title (in English) H plasma passivation of MOCVD grown GaAs-on-Si
Sub Title (in English)
Keyword(1) GaAs-on Si
Keyword(2) H plasma
Keyword(3) passivation
Keyword(4) C-V
Keyword(5) PL
Keyword(6) DLTS
1st Author's Name Gang Wang
1st Author's Affiliation Department of Electrical and Computer Engineering, Nagoya Institute of Technology()
2nd Author's Name Tetsuo Soga
2nd Author's Affiliation Department of Environmental Technology and Urbon Planning, Nagoya Institute of Technology
3rd Author's Name Takashi Jimbo
3rd Author's Affiliation Department of Environmental Technology and Urbon Planning, Nagoya Institute of Technology
4th Author's Name Masayoshi Umeno
4th Author's Affiliation Department of Electrical and Computer Engineering, Nagoya Institute of Technology
Date 1998/5/22
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Volume (vol) vol.98
Number (no) 60
Page pp.pp.-
#Pages 6
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