| Presentation | 1998/5/22 Preparation of SiC Thin Film Using Organic Si Material by Remote Plasma CVD Method Ying-Yu XU, Takahiro MURAMATSU, Toru AOKI, Yoichiro NAKANISHI, Yoshinori HATANAKA, |
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| PDF Download Page | PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | SiC film was deposited by remote plasma enhanced CVD method using Hexamethyldisilane(HMDS) as a Si monomer source. The composition of deposited film influenced by the kind of plasma gas. Using nitrogen and hydrogen mixture gas as plasma gas, obtained film contained large amount of nitrogen, and when using argon and hydrogen mixture gas, deposited film was a SiC film contained a large hydrogen content. In this research, we found that hydrogen radicals are very active for monomer source that can be solved to precursor for film deposition. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | Remote Plasma CVD / Hexamethyldisilane(HMDS) / SiC film / SiC:H film |
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| Conference Information | |
| Committee | ED |
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| Conference Date | 1998/5/22(1days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
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| Registration To | Electron Devices (ED) |
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| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Preparation of SiC Thin Film Using Organic Si Material by Remote Plasma CVD Method |
| Sub Title (in English) | |
| Keyword(1) | Remote Plasma CVD |
| Keyword(2) | Hexamethyldisilane(HMDS) |
| Keyword(3) | SiC film |
| Keyword(4) | SiC:H film |
| 1st Author's Name | Ying-Yu XU |
| 1st Author's Affiliation | Graduate School of Electronics Science and Technology, Shizuoka Univ.() |
| 2nd Author's Name | Takahiro MURAMATSU |
| 2nd Author's Affiliation | Research Institute of Electronics, Shizuoka Univ. |
| 3rd Author's Name | Toru AOKI |
| 3rd Author's Affiliation | Graduate School of Electronics Science and Technology, Shizuoka Univ. |
| 4th Author's Name | Yoichiro NAKANISHI |
| 4th Author's Affiliation | Graduate School of Electronics Science and Technology, Shizuoka Univ.:Research Institute of Electronics, Shizuoka Univ. |
| 5th Author's Name | Yoshinori HATANAKA |
| 5th Author's Affiliation | Graduate School of Electronics Science and Technology, Shizuoka Univ.:Research Institute of Electronics, Shizuoka Univ. |
| Date | 1998/5/22 |
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| Volume (vol) | vol.98 |
| Number (no) | 60 |
| Page | pp.pp.- |
| #Pages | 5 |
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