Presentation 1993/6/25
Improvements of Fault Detection Efficiency for Failure Analysis of VLSI Memories Using Emission Microscope Connected with VLSI Test System
Tatsuya Ishii, Kensaku Naitoh, Kazutoshi Miyamoto,
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Abstract(in English) The increasing density and complexity of VLSI memories such as DRAMs,which become difficult fault locating on the chip.A technique is described for an application of photo emission microscopy to analysis of functional failures in VLSI menories using emission microscope connected with VLSI test system(ATE).The conventional photo emission microscopy technique was used static condition on the chip.This new technique due to dynamically fault isolate leakage and snapping sites,which could greatly improve fault detection efficiency as compared with conventional technique. And we applied this technique to backside photo emission inspection of silicon chip,so function failure sites under the malti-level metal layer and inner lead of LOC(Lead On Chip)on the chip can be analysed.
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Keyword(in English) Failure Analysis / Emission Microscope / VLSI Test System / VLSI Memories / DRAM
Paper # ED93-48,ICD93-47
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Committee ED
Conference Date 1993/6/25(1days)
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Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Improvements of Fault Detection Efficiency for Failure Analysis of VLSI Memories Using Emission Microscope Connected with VLSI Test System
Sub Title (in English)
Keyword(1) Failure Analysis
Keyword(2) Emission Microscope
Keyword(3) VLSI Test System
Keyword(4) VLSI Memories
Keyword(5) DRAM
1st Author's Name Tatsuya Ishii
1st Author's Affiliation Kita-Itami Works,Mitsubishi Electric()
2nd Author's Name Kensaku Naitoh
2nd Author's Affiliation Tada Electric
3rd Author's Name Kazutoshi Miyamoto
3rd Author's Affiliation Kita-Itami Works,Mitsubishi Electric
Date 1993/6/25
Paper # ED93-48,ICD93-47
Volume (vol) vol.93
Number (no) 112
Page pp.pp.-
#Pages 7
Date of Issue