Presentation 1993/10/21
Epitaxial growth of InSb on Si
Hirofumi Ohba, Takashi Haryuu, Shoichi Ono,
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Abstract(in Japanese) (See Japanese page)
Abstract(in English) InSb has been epitaxially grown directly on Si by plasma- assisted epitaxy(PAE)in discharging plasma.Furthermore some experiments related to Si surface cleaning prior to epitaxial growth were carried out.Reflection high-energy electron diffraction(RHEED)studies indicate that the property of InSb films is critically affected by the method of cleaning using hydrogen plasma exposure.Arsenic exposure following Si surface cleaning is effective in surface passivation and makes the epitaxial growth of InSb possible on Si(111).
Keyword(in Japanese) (See Japanese page)
Keyword(in English) InSb / PAE / Si surface cleaning / hydrogen plasma exposure / As exposure / RHEED
Paper # ED93-104
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Conference Information
Committee ED
Conference Date 1993/10/21(1days)
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Registration To Electron Devices (ED)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Epitaxial growth of InSb on Si
Sub Title (in English)
Keyword(1) InSb
Keyword(2) PAE
Keyword(3) Si surface cleaning
Keyword(4) hydrogen plasma exposure
Keyword(5) As exposure
Keyword(6) RHEED
1st Author's Name Hirofumi Ohba
1st Author's Affiliation Department of Electronic Engineering,Tohoku University()
2nd Author's Name Takashi Haryuu
2nd Author's Affiliation Department of Electronic Engineering,Tohoku University
3rd Author's Name Shoichi Ono
3rd Author's Affiliation Research Institute of Electrical Communication,Tohoku University
Date 1993/10/21
Paper # ED93-104
Volume (vol) vol.93
Number (no) 285
Page pp.pp.-
#Pages 7
Date of Issue