Presentation 1995/10/20
InP-based Resonant Tunneling Diode with a Cathode-Well Structure
Takayuki Nakagawa, Takaya Nakano, Kanji Yoh,
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Abstract(in English) InGaAs/AlAs/InAs resonant tunneling diodes (RTDs) with a cathode well have been fabricated to investigate the effacts of inserting a cathode well to RTD. Peak-to-valley ratio of 7.7 and the peak current density of 6.4×10^4 A/cm^2 were obtained in the RTDs with a cathode well, which are higher than the data of RTDs without a cathode well by a factor of 3.5 and 3, respectively. These improvements are presumably due to the formation of higher peak distribution density of electrons confined in a cathode well. The width of the resonance level was estimated to be 46 meV in both RTD structures by the analysis of current-voltage characteristics. This result confirms that the observed improvements of electric characteristics are due to two-dimensional electron density distribution.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) cathode-well / resonant tunneling diode / electron density distribution / InAs
Paper # ED95-115
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Committee ED
Conference Date 1995/10/20(1days)
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Registration To Electron Devices (ED)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) InP-based Resonant Tunneling Diode with a Cathode-Well Structure
Sub Title (in English)
Keyword(1) cathode-well
Keyword(2) resonant tunneling diode
Keyword(3) electron density distribution
Keyword(4) InAs
1st Author's Name Takayuki Nakagawa
1st Author's Affiliation Research Center for Interface Quantum Electronics, Hokkaido University()
2nd Author's Name Takaya Nakano
2nd Author's Affiliation Research Center for Interface Quantum Electronics, Hokkaido University
3rd Author's Name Kanji Yoh
3rd Author's Affiliation Research Center for Interface Quantum Electronics, Hokkaido University
Date 1995/10/20
Paper # ED95-115
Volume (vol) vol.95
Number (no) 315
Page pp.pp.-
#Pages 8
Date of Issue