Presentation 1996/1/18
Development of Graded-GaAsP Bases in Heterojunction Bipolar Transistors
N lkeda, M Ohkubo, T Ninomiya,
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Abstract(in Japanese) (See Japanese page)
Abstract(in English) First fabrication of the strained graded-GaAsP base HBTs with InGaP emitters was successfully demonstrated. It was confirmed that heavily carbon-doping into MOCVD grown GaAsP layer, as well as GaAs, was applicable to base layer. Compared to the uniform-GaAs base HBTs, it was also confirmed that, for the GaAsP/GaAs system, ΔE_v/ ΔE_G ratio was about more than 0.5, which was derived from the Gummel plot of collector current. Furthermore, both of current-gain and cutoff frequency(f_T) enhancement due to built-in field compared with the uniform-base HBTs was confirmed. Current-gain enhancement factor was found to be strongly dependent on amount of strain. By extracting the base transit time reduction in the graded base structure, average velocity in the base is calculated for the graded base HBT.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) InGaP/GaAsP HBT / graded-base / base transit time
Paper # ED95-154,MW95-139,ICD95-210
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Conference Information
Committee ED
Conference Date 1996/1/18(1days)
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Paper Information
Registration To Electron Devices (ED)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Development of Graded-GaAsP Bases in Heterojunction Bipolar Transistors
Sub Title (in English)
Keyword(1) InGaP/GaAsP HBT
Keyword(2) graded-base
Keyword(3) base transit time
1st Author's Name N lkeda
1st Author's Affiliation The Furukawa Electric Co. Ltd., Yokohama laboratories()
2nd Author's Name M Ohkubo
2nd Author's Affiliation The Furukawa Electric Co. Ltd., Yokohama laboratories
3rd Author's Name T Ninomiya
3rd Author's Affiliation The Furukawa Electric Co. Ltd., Yokohama laboratories
Date 1996/1/18
Paper # ED95-154,MW95-139,ICD95-210
Volume (vol) vol.95
Number (no) 449
Page pp.pp.-
#Pages 6
Date of Issue