Presentation 1996/1/18
Numerical Analysis of Drain Lag Phenomena in HJFETs on Hole-Trap Substrates
Masanobu Nogome, Kazuaki Kunihiro, Yasuo Ohno,
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Abstract(in Japanese) (See Japanese page)
Abstract(in English) The rate-limiting processes in drain lag phenomena in HJFETs on hole-trap are investigated using numerical device simulation with SRH statistics for deep traps. The drain current slow responses for floating substrates are determined by electron capture or emission, since hole cannot contribute to the trap charge variation there. In addition, the time constants are much smaller than those estimated from the trap parameters due to the charge variation enhancement by internal hole movements. On the other hand, the time constants are determined by hole current travelling from the electrode to the traps in FET with substrate electrodes. Those results indicates that care should be taken which factor determines the drain lags in FETs.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) HJFET / hole-trap / drain lag / deep level / SRH statistics
Paper # ED95-153,MW95-138,ICD95-209
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Committee ED
Conference Date 1996/1/18(1days)
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Registration To Electron Devices (ED)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Numerical Analysis of Drain Lag Phenomena in HJFETs on Hole-Trap Substrates
Sub Title (in English)
Keyword(1) HJFET
Keyword(2) hole-trap
Keyword(3) drain lag
Keyword(4) deep level
Keyword(5) SRH statistics
1st Author's Name Masanobu Nogome
1st Author's Affiliation Microelectronics Research Laboratories NEC Corporation()
2nd Author's Name Kazuaki Kunihiro
2nd Author's Affiliation Microelectronics Research Laboratories NEC Corporation
3rd Author's Name Yasuo Ohno
3rd Author's Affiliation Microelectronics Research Laboratories NEC Corporation
Date 1996/1/18
Paper # ED95-153,MW95-138,ICD95-209
Volume (vol) vol.95
Number (no) 449
Page pp.pp.-
#Pages 6
Date of Issue