Presentation 1996/1/18
Novel sub-quarter micron GaAs MESFET process with WSi sidewall gate
Tomoya Uda, Mitsuru Nishitsuji, Katsunori Nishii, Kazuhisa Fujimoto, Akiyoshi Tamura,
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Abstract(in Japanese) (See Japanese page)
Abstract(in English) We have developed a novel sub-quarter micron WSi sidewall gate GaAs MESFET (SIG-FET) fabrication process. In this process, using WSi sidewalls as gate electrodes, the gate length is controlled only by the thickness of a WSi thin film deposited by sputtering and sub-quarter micron gates can be easily fabricated without using photo-lithography. The 0.15-μm-gate SIG-FET has exhibited f = 50 GHz and fmax = 120 GHz.This novel process technology is very promising for fabricating high-performance sub-quarter micron gate MESFET's with low costs and high throughput.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) sub-quarter micron GaAs MESFET / WSi sidewall / sidewall gate / ft / fmax
Paper # ED95-151,MW95-136,ICD95-207
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Committee ED
Conference Date 1996/1/18(1days)
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Registration To Electron Devices (ED)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Novel sub-quarter micron GaAs MESFET process with WSi sidewall gate
Sub Title (in English)
Keyword(1) sub-quarter micron GaAs MESFET
Keyword(2) WSi sidewall
Keyword(3) sidewall gate
Keyword(4) ft
Keyword(5) fmax
1st Author's Name Tomoya Uda
1st Author's Affiliation Electronics Research Laboratory, Matsushita Electronics Corporation()
2nd Author's Name Mitsuru Nishitsuji
2nd Author's Affiliation Electronics Research Laboratory, Matsushita Electronics Corporation
3rd Author's Name Katsunori Nishii
3rd Author's Affiliation Electronics Research Laboratory, Matsushita Electronics Corporation
4th Author's Name Kazuhisa Fujimoto
4th Author's Affiliation Electronics Research Laboratory, Matsushita Electronics Corporation
5th Author's Name Akiyoshi Tamura
5th Author's Affiliation Electronics Research Laboratory, Matsushita Electronics Corporation
Date 1996/1/18
Paper # ED95-151,MW95-136,ICD95-207
Volume (vol) vol.95
Number (no) 449
Page pp.pp.-
#Pages 6
Date of Issue