Presentation 1995/12/14
Microchannel Plate Using Photosensitive Glass
T. Sakamoto, K. Takahashi,
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Abstract(in English) We proposed a new MCP with a monolithic structure, which was formed on a single crystal silicon substrate by using micro fabrication technologies. However, the form of the micro-channels of this MCP is a slit structure because the micro-channels are formed by using silicon anisotropic etching. In this study, we have developed technologies of forming microchannels on photosensitive glass as the MCP substrate. Etching speed by HF etchant of an area exposed to UV can be increased, and microchannels with any form defined by the mask pattern can be produced. Secondary, electron multiplication films are formed by the sol-gel method using an alkoxide of Pb which is deposited on the internal surface of microchannels. The electron gain of the MCP fabricated by this method was about 22 at the dynode voltage of 600 V, and aspect ratio of the microchannel was 8.4.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) MCP / photosensitive glass / Sol-gel method / Secondary electron multiplication films
Paper # ED95-135
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Committee ED
Conference Date 1995/12/14(1days)
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Registration To Electron Devices (ED)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Microchannel Plate Using Photosensitive Glass
Sub Title (in English)
Keyword(1) MCP
Keyword(2) photosensitive glass
Keyword(3) Sol-gel method
Keyword(4) Secondary electron multiplication films
1st Author's Name T. Sakamoto
1st Author's Affiliation Department Electronics, Faculty of Engineering Saitama University()
2nd Author's Name K. Takahashi
2nd Author's Affiliation Department Electronics, Faculty of Engineering Saitama University
Date 1995/12/14
Paper # ED95-135
Volume (vol) vol.95
Number (no) 424
Page pp.pp.-
#Pages 6
Date of Issue