Presentation 1995/12/14
Emission Characteristics of Si Emitter with P-N Junction
Takayuki Hirano, Seigo Kanemaru, Hisao Tanoue, Junji Itoh,
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Abstract(in English) The emission characteristics of the gated field emitter arrays (FEAs) with p-n junction have been reported. The gated FEAs with p-n junction were made by ion implantation as well as n-type and p-type FEAs with various impurity concentration. The n and p/n (n-emitter with p-type surface) FEAs had I-V characteristics in agreement with the Fowler-Nordheim theory. The p and n/p tips exhibited a current saturation property. In this saturation region, the stabilization of the emission current and photo-sensitivity were observed. C-V data indicated an inversion layer and a depletion layer under gate electrode. The present saturation mechanism is explained by considering the depletion layer below the emitter tips and gates.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) vacuum microelectronics / field emitter / electron emission / ion implantation / silicon emitter / pn junction
Paper # ED95-133
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Committee ED
Conference Date 1995/12/14(1days)
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Registration To Electron Devices (ED)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Emission Characteristics of Si Emitter with P-N Junction
Sub Title (in English)
Keyword(1) vacuum microelectronics
Keyword(2) field emitter
Keyword(3) electron emission
Keyword(4) ion implantation
Keyword(5) silicon emitter
Keyword(6) pn junction
1st Author's Name Takayuki Hirano
1st Author's Affiliation Kobe Steel, Ltd.()
2nd Author's Name Seigo Kanemaru
2nd Author's Affiliation Electrotechnical Laboratory
3rd Author's Name Hisao Tanoue
3rd Author's Affiliation Electrotechnical Laboratory
4th Author's Name Junji Itoh
4th Author's Affiliation Electrotechnical Laboratory
Date 1995/12/14
Paper # ED95-133
Volume (vol) vol.95
Number (no) 424
Page pp.pp.-
#Pages 8
Date of Issue