Presentation 1996/12/13
Fabrication of Si field emitter by anodization
Katsuya Higa, Kiyoaki Nishii, Tanemasa Asano,
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Abstract(in Japanese) (See Japanese page)
Abstract(in English) We have investigated new fabrication process of field emitter array by Si anodization. When anodization is carried out in the dark, porous Si is preferentially formed in a p-type region. The field emitter structures can be formed beneath the unanodized n-type Si island. The porous region can be used as a sacrificial region. The shape of emitter structure can be controlled by the dimension of unanodized Si region and the varying the resistivity of p-type region. It has been found that, by utilizing these characteristics, various field emitter structures can be formed from single-crystal Si. Fabrication of field emitter array and the measurement of emission currents are demonstrated.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) anodization / porous Si / field emitter
Paper # ED96-139
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Committee ED
Conference Date 1996/12/13(1days)
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Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Fabrication of Si field emitter by anodization
Sub Title (in English)
Keyword(1) anodization
Keyword(2) porous Si
Keyword(3) field emitter
1st Author's Name Katsuya Higa
1st Author's Affiliation Center for Microelectronic Systems, Kyushu Institute of Technology()
2nd Author's Name Kiyoaki Nishii
2nd Author's Affiliation Center for Microelectronic Systems, Kyushu Institute of Technology
3rd Author's Name Tanemasa Asano
3rd Author's Affiliation Center for Microelectronic Systems, Kyushu Institute of Technology
Date 1996/12/13
Paper # ED96-139
Volume (vol) vol.96
Number (no) 412
Page pp.pp.-
#Pages 6
Date of Issue