Presentation | 1997/3/14 Aluminum Single-Electron Devices J. S. Tsai, Y. Nakamura, C. D. Chen, |
---|---|
PDF Download Page | PDF download Page Link |
Abstract(in Japanese) | (See Japanese page) |
Abstract(in English) | Aluminum single-electron device shows an ideal gate modulation characteristic, a rather high current density, a reasonable reproducibility, and its operation is often completely analytical. We have fabricated Al single electron devices having 20 nm islands with an electron-beam lithography. They showed perfect gate modulations and functioned as electrometer up to temperature above 100K. We have also developed an electrochemical micro-fabrication process (ACME process) which could be routinely used to enhance the operation temperature of the Al devices up to 10 times. A room temperature operable device based on these fabrication methods, a single-electron flash memory, was proposed and its operation simulated. |
Keyword(in Japanese) | (See Japanese page) |
Keyword(in English) | single-electron device / aluminum tunnel junction / micro-fabrication / charging energy / electron-beam lithography / flash memory |
Paper # | ED96-220 |
Date of Issue |
Conference Information | |
Committee | ED |
---|---|
Conference Date | 1997/3/14(1days) |
Place (in Japanese) | (See Japanese page) |
Place (in English) | |
Topics (in Japanese) | (See Japanese page) |
Topics (in English) | |
Chair | |
Vice Chair | |
Secretary | |
Assistant |
Paper Information | |
Registration To | Electron Devices (ED) |
---|---|
Language | JPN |
Title (in Japanese) | (See Japanese page) |
Sub Title (in Japanese) | (See Japanese page) |
Title (in English) | Aluminum Single-Electron Devices |
Sub Title (in English) | |
Keyword(1) | single-electron device |
Keyword(2) | aluminum tunnel junction |
Keyword(3) | micro-fabrication |
Keyword(4) | charging energy |
Keyword(5) | electron-beam lithography |
Keyword(6) | flash memory |
1st Author's Name | J. S. Tsai |
1st Author's Affiliation | NEC Fundamental Research Laboratories() |
2nd Author's Name | Y. Nakamura |
2nd Author's Affiliation | NEC Fundamental Research Laboratories |
3rd Author's Name | C. D. Chen |
3rd Author's Affiliation | NEC Fundamental Research Laboratories |
Date | 1997/3/14 |
Paper # | ED96-220 |
Volume (vol) | vol.96 |
Number (no) | 573 |
Page | pp.pp.- |
#Pages | 6 |
Date of Issue |