| Presentation | 1997/12/12 Electron Emission from an Ion Beam Modified Photoresist and Its Application to Field Emitter Array Tanemasa Asano, Daisuke Sasaguri, Yoko Nomaguchi, Katsuya Higa, |
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| PDF Download Page | PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | Ion beam irradiation effects on a novolac positive-tone photoresist and its application to micron-size field emitters have been investigated. The electrical resistivity of the photoresist film is found to decrease after Ar ion implantation at doses on the order of 10^<16> cm^<-2<. Baking of the photoresist prior to irradation at a high temperature is preferred to produce electrical conductivity. P ions show weaker effects than Ar ions. Raman spectroscopy shows that carbon-carbon bonds such as the graphite bond are produced due to ion bombardment. The field emission of electrons is observed from emitters made of the ion-irradiated photoresist. The emission current is shown to be fairly stable when it is compared with an emission characteristic of. synthesized diamond. Fabrication of field emitter arrays using a mold technique is demonstrated. The field emitter array shows emission at a current level of about 40 μA. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | field emitter array / ion beam modification / photoresist / field emission display |
| Paper # | ED97-175 |
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| Conference Information | |
| Committee | ED |
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| Conference Date | 1997/12/12(1days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
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| Paper Information | |
| Registration To | Electron Devices (ED) |
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| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Electron Emission from an Ion Beam Modified Photoresist and Its Application to Field Emitter Array |
| Sub Title (in English) | |
| Keyword(1) | field emitter array |
| Keyword(2) | ion beam modification |
| Keyword(3) | photoresist |
| Keyword(4) | field emission display |
| 1st Author's Name | Tanemasa Asano |
| 1st Author's Affiliation | Center for Microelectronic Systems, Kyusyu Institute of Technology() |
| 2nd Author's Name | Daisuke Sasaguri |
| 2nd Author's Affiliation | Center for Microelectronic Systems, Kyusyu Institute of Technology |
| 3rd Author's Name | Yoko Nomaguchi |
| 3rd Author's Affiliation | Center for Microelectronic Systems, Kyusyu Institute of Technology |
| 4th Author's Name | Katsuya Higa |
| 4th Author's Affiliation | Center for Microelectronic Systems, Kyusyu Institute of Technology |
| Date | 1997/12/12 |
| Paper # | ED97-175 |
| Volume (vol) | vol.97 |
| Number (no) | 438 |
| Page | pp.pp.- |
| #Pages | 6 |
| Date of Issue | |