Presentation 1997/7/15
Nanofabrication of n-GaAs by Electrochemical STM
T. Okumura, C. Kaneshiro,
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Abstract(in English) Controllable etching of n-GaAs has been successfully achieved in acidic solutions with and without Ni ions by using an electrochemical scanning tunneling microscope(STM). The realized features were as small as 10 nm. The experimental results indicate that the hole injection from an STM tip is responsible for the local etching of n-GaAs suffaces. In the same solution, Ni islands of a submicron size were deposited on GaAs beneath the STM tip.
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Keyword(in English) GaAs / electrochemical STM / nanofabrication / local etching / local electrodeposition
Paper # ED97-79
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Committee ED
Conference Date 1997/7/15(1days)
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Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Nanofabrication of n-GaAs by Electrochemical STM
Sub Title (in English)
Keyword(1) GaAs
Keyword(2) electrochemical STM
Keyword(3) nanofabrication
Keyword(4) local etching
Keyword(5) local electrodeposition
1st Author's Name T. Okumura
1st Author's Affiliation Department of Electrical Engineering, Tokyo Metropolitan University()
2nd Author's Name C. Kaneshiro
2nd Author's Affiliation Department of Electrical Engineering, Tokyo Metropolitan University:Hokkaido Univ.
Date 1997/7/15
Paper # ED97-79
Volume (vol) vol.97
Number (no) 159
Page pp.pp.-
#Pages 6
Date of Issue