Presentation 1997/5/23
Selective growth of GaN on sub-micron pattern by MOVPE
Hidetada Matsushima, Kazumasa Hiramatsu, Hisayoshi Hanai, Nobuhiko Sawaki,
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Abstract(in English) The sub-micron GaN dot structure has been realized by selective area growth (SAG) using MOVPE. Truncated hexagon sub-micron dot structures having (0001) plane and {11^^-01} fasets were obtained by SAG on SiO_2 dot pattern fabricated by laser holography. Morphology of GaN depends on the crystal axis of the sub-micron line patterns. The lateral growth rate to the line pattern along <11^^-00> direction is much faster than that to the <112^^-0> direction. So if we use sub-micron line patterns along <11^^-OO> axis the GaN structures coalesce, resulting in buried structures of the SiO_2 mask.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) GaN / MOVPE / sub-micron dot / selective area growth
Paper # ED97-32,CPM97-20
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Committee ED
Conference Date 1997/5/23(1days)
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Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Selective growth of GaN on sub-micron pattern by MOVPE
Sub Title (in English)
Keyword(1) GaN
Keyword(2) MOVPE
Keyword(3) sub-micron dot
Keyword(4) selective area growth
1st Author's Name Hidetada Matsushima
1st Author's Affiliation Department of Electronics, Nagoya University()
2nd Author's Name Kazumasa Hiramatsu
2nd Author's Affiliation Department of Electrical and Electronic, Mie University
3rd Author's Name Hisayoshi Hanai
3rd Author's Affiliation Department of Electronics, Nagoya University
4th Author's Name Nobuhiko Sawaki
4th Author's Affiliation Department of Electronics, Nagoya University
Date 1997/5/23
Paper # ED97-32,CPM97-20
Volume (vol) vol.97
Number (no) 59
Page pp.pp.-
#Pages 6
Date of Issue