Presentation 2001/10/19
Sputtered Species Incident to Substrate in the Sputter-deposition of TiO_2 Films
Yoichi HOSHI,
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Abstract(in Japanese) (See Japanese page)
Abstract(in English) Sputtered species incident to substrate in the sputter deposition of TiO_2 thin films were measured by using an ion mass spectroscopy and photo-emission spectroscopy. As a result, TiO+ and TiO_2+ ions along with Ti+ ion began to be detected at an oxygen gas content where Ti metal target was fully covered with oxide layer during sputtering. This result indicates that molecules such as TiO and TiO_2 along with Ti and O atoms are also emitted from the target surface when the titanium oxide is sputtered. Transparent TiO_2 films were obtained at the same conditions where photo-emission spectrum from O_2+ was observed and TiO+ ions were detected. When TiO_2 oxide target was used, it was found that deposition rate of the film increased steeply as the oxygen gas content in the sputtering gas decreases beow 3%.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) TiO_2 films / sputtering / sputtered particle / mass spectroscopy / photo-emission spectroscopy
Paper # CPM2001-111
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Conference Information
Committee CPM
Conference Date 2001/10/19(1days)
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Registration To Component Parts and Materials (CPM)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Sputtered Species Incident to Substrate in the Sputter-deposition of TiO_2 Films
Sub Title (in English)
Keyword(1) TiO_2 films
Keyword(2) sputtering
Keyword(3) sputtered particle
Keyword(4) mass spectroscopy
Keyword(5) photo-emission spectroscopy
1st Author's Name Yoichi HOSHI
1st Author's Affiliation Faculty of Engineering, Tokyo Institute of Polytechnics()
Date 2001/10/19
Paper # CPM2001-111
Volume (vol) vol.101
Number (no) 395
Page pp.pp.-
#Pages 6
Date of Issue