| Presentation | 2001/7/26 Electrical properties and structure of titanium oxide thin films formed by metalorganic decomposition. Shinichi MAEDA, Hisashi FUKUDA, Shigeru NOMURA, |
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| PDF Download Page | PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | High-k dielectric thin films have attained considerable attention as possible replacements for dielectric insulators of sub-0.1μm MOSFET in future ULSIs.Bulk TiO_2 has higher dielectric constant as compared to another high-k dielectric materials. Thus, TiO_2 is one of the expected high-k dielectric materials. In this study, we formed TiO_2 thin film on a Si substrate by metalorganic decomposition(MOD). And, the crystal structure and the electrical properties of the film were investigated. TiO_2 thin film crystallized in the anatase structure and the rutile structure after annealing at 600℃. The TiO_2 thin film becomes to the rutile structure after annealing above 700℃. The dielectric constant of 50 in maximum was obtained for the sample annealed at 700℃. In addition, we confirmed that the dielectric constant decreases corresponding to the change of TiO_2 thin film surface structure. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | TiO_2 / MOSFET / High-k dielectric / metalorganic decomposition |
| Paper # | CPM2001-40 |
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| Conference Information | |
| Committee | CPM |
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| Conference Date | 2001/7/26(1days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | |
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| Vice Chair | |
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| Paper Information | |
| Registration To | Component Parts and Materials (CPM) |
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| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Electrical properties and structure of titanium oxide thin films formed by metalorganic decomposition. |
| Sub Title (in English) | |
| Keyword(1) | TiO_2 |
| Keyword(2) | MOSFET |
| Keyword(3) | High-k dielectric |
| Keyword(4) | metalorganic decomposition |
| 1st Author's Name | Shinichi MAEDA |
| 1st Author's Affiliation | Department of Electrical and Electronic Engineering, Faculty of Engineering, Muroran Institute of Technology() |
| 2nd Author's Name | Hisashi FUKUDA |
| 2nd Author's Affiliation | Department of Electrical and Electronic Engineering, Faculty of Engineering, Muroran Institute of Technology |
| 3rd Author's Name | Shigeru NOMURA |
| 3rd Author's Affiliation | Department of Electrical and Electronic Engineering, Faculty of Engineering, Muroran Institute of Technology |
| Date | 2001/7/26 |
| Paper # | CPM2001-40 |
| Volume (vol) | vol.101 |
| Number (no) | 244 |
| Page | pp.pp.- |
| #Pages | 6 |
| Date of Issue | |