Presentation 2001/6/29
A Study on Fabrication of SAW Devices with EB Photolithography
H. Ozawa, S. Nakagomi, T. Omori, K. Hashimoto, M. Yamaguchi,
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Abstract(in Japanese) (See Japanese page)
Abstract(in English) Rapid development of SAW devices requires to shorten development period. This paper discusses applicability of EB photolithography based on the scanning electron microscope(SEM) to reduce the time required for the development of prototype devices. In addition to the wet etching process, the lift-off process with an antistatic coating was discussed.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) EB photolithography / wet etching / lift-off process
Paper # US2001-30, EMD2001-22 CPM2001-37, OME2001-32
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Committee CPM
Conference Date 2001/6/29(1days)
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Registration To Component Parts and Materials (CPM)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) A Study on Fabrication of SAW Devices with EB Photolithography
Sub Title (in English)
Keyword(1) EB photolithography
Keyword(2) wet etching
Keyword(3) lift-off process
1st Author's Name H. Ozawa
1st Author's Affiliation Graduate School of Science and Technology, Chiba University()
2nd Author's Name S. Nakagomi
2nd Author's Affiliation Graduate School of Science and Technology, Chiba University
3rd Author's Name T. Omori
3rd Author's Affiliation Dept.Electronics and Mechanical Eng., Chiba University
4th Author's Name K. Hashimoto
4th Author's Affiliation Dept.Electronics and Mechanical Eng., Chiba University
5th Author's Name M. Yamaguchi
5th Author's Affiliation Dept.Electronics and Mechanical Eng., Chiba University
Date 2001/6/29
Paper # US2001-30, EMD2001-22 CPM2001-37, OME2001-32
Volume (vol) vol.101
Number (no) 170
Page pp.pp.-
#Pages 6
Date of Issue