Presentation | 2000/10/19 Low-temperature deposition of ITO thin films by sputter-beam deposition Takakazu Kiyomura, Ryoma OHKI, Yoichi Hoshi, |
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Abstract(in Japanese) | (See Japanese page) |
Abstract(in English) | Tin(Sn)-doped indium oxide(ITO)thin films have been deposited at a low temperature(about room temperature)by using sputter-beam deposition(SBD)in which kinetic energies of the sputtered particles incident to the substrate normal can be controlled in the formation of the films. Structure of the ITO films changed significantly with gas pressure in the sputtering source. The ITO films obtained at a gas pressure of 0.7mTorr had a crystalline phase, while at gas pressures above 2mTorr, amorphous-like films were obtained. These films had excellent surface smoothness along with a low resistivity between 7.2×10^<-4>Ω・cm and 3×10^<-4>Ω・cm and high transparency in visible region. These indicate the high potential of SBD for obtaining low-resistivity ITO thin films at low temperatures. |
Keyword(in Japanese) | (See Japanese page) |
Keyword(in English) | indium tin oxide / ITO / sputter-beam deposition / structural properties / optoelectronic properties |
Paper # | CPM2000-126 |
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Conference Information | |
Committee | CPM |
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Conference Date | 2000/10/19(1days) |
Place (in Japanese) | (See Japanese page) |
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Topics (in Japanese) | (See Japanese page) |
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Paper Information | |
Registration To | Component Parts and Materials (CPM) |
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Language | JPN |
Title (in Japanese) | (See Japanese page) |
Sub Title (in Japanese) | (See Japanese page) |
Title (in English) | Low-temperature deposition of ITO thin films by sputter-beam deposition |
Sub Title (in English) | |
Keyword(1) | indium tin oxide |
Keyword(2) | ITO |
Keyword(3) | sputter-beam deposition |
Keyword(4) | structural properties |
Keyword(5) | optoelectronic properties |
1st Author's Name | Takakazu Kiyomura |
1st Author's Affiliation | Department of Electronics and Computer Engineering, Faculty of Engineering Tokyo Institute of Polytechnics() |
2nd Author's Name | Ryoma OHKI |
2nd Author's Affiliation | Department of Electronics and Computer Engineering, Faculty of Engineering Tokyo Institute of Polytechnics |
3rd Author's Name | Yoichi Hoshi |
3rd Author's Affiliation | Department of Electronics and Computer Engineering, Faculty of Engineering Tokyo Institute of Polytechnics |
Date | 2000/10/19 |
Paper # | CPM2000-126 |
Volume (vol) | vol.100 |
Number (no) | 395 |
Page | pp.pp.- |
#Pages | 6 |
Date of Issue |