| Presentation | 2000/10/19 Sequential Epitaxial Growth of(111)Cu/(111)HfN Bilayered Film on(111)Si and Diffusion Barrier Property of(111)HfN Film Satoko SHINKAI, Katsutaka SASAKI, |
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| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | Sequential epitaxial growth of(111)Cu top metallization layer with the excellent EM resistance could be realized on the epitaxial(111)HfN/(111)Si system without intentional substrate heating. Then, thinning limit of HfN film as a barrier layer was investigated, in order to confirm whether this(111)Cu/(111)HfN/(111)Si contact system can tolerate temperature(400℃, 30min)required for the normal post-metallization process and the system is appicable to the sub-0.1μm design rule. As a result, it was revealed that the system is sufficiently stable up to the temperature required for the normal post-metallization process, maintaining the initial contact structure of sequential epitaxial growth of(111)Cu/(111)HfN/(111)Si, even if the thickness of HfN film as a diffusion barrier was reduced to 80 Å. Therefore, it was concluded that the sequential epitaxial growth of(111)Cu/(111)HfN bilayered film on(111)Si is one of the most promising methods for improving the reliability of Cu metallization system for Si-LSI. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | Cu metallization / lattice mismatch / XRD pole figure / sequential epitaxial growth / EM resistance |
| Paper # | CPM2000-122 |
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| Conference Information | |
| Committee | CPM |
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| Conference Date | 2000/10/19(1days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
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| Paper Information | |
| Registration To | Component Parts and Materials (CPM) |
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| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Sequential Epitaxial Growth of(111)Cu/(111)HfN Bilayered Film on(111)Si and Diffusion Barrier Property of(111)HfN Film |
| Sub Title (in English) | |
| Keyword(1) | Cu metallization |
| Keyword(2) | lattice mismatch |
| Keyword(3) | XRD pole figure |
| Keyword(4) | sequential epitaxial growth |
| Keyword(5) | EM resistance |
| 1st Author's Name | Satoko SHINKAI |
| 1st Author's Affiliation | Research Fellow of the Japan Society for the Promotion of Science.(PD)() |
| 2nd Author's Name | Katsutaka SASAKI |
| 2nd Author's Affiliation | Department of Materials Science, Faculty of Engineering, Kitami Institute of Technology |
| Date | 2000/10/19 |
| Paper # | CPM2000-122 |
| Volume (vol) | vol.100 |
| Number (no) | 395 |
| Page | pp.pp.- |
| #Pages | 6 |
| Date of Issue | |