| Presentation | 2000/10/19 Heteroepitaxial Growth of Bi_2Sr_2CuO_x thin films on Si(001) Toyokazu TAMBO, Atsushi SHIMIZU, Akiyoshi MATSUDA, Chiei TATSUYAMA, |
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| PDF Download Page | PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | We have studied the heteroepitaxial growth of superconductor thin films on a Si substrate by molecular beam epitaxy. A SrO layer is used as a buffer layer to avoid the interdiffusion at the interface of Si and Bi_2Sr_2CuO_x. The mismatch is -5.4% and 5.1% for Si-SrO and SrO-Bi_2Sr_2CuO_x, repectively. The crystallinity of films is evaulated by the X-ray diffraction patterns. The appropriate growth temperature for the Bi_2Sr_2CuO_x thin films is 600℃. But the sample degenerates in air. So the improvement of this film was performed by annealing or 2-step growth. In those trials the 2-step growth at 600 and 700℃ produces a good result. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | superconductor / thin film / MBE / Si / SrO / BiSrCuO / XRD |
| Paper # | CPM2000-120 |
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| Conference Information | |
| Committee | CPM |
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| Conference Date | 2000/10/19(1days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | |
| Chair | |
| Vice Chair | |
| Secretary | |
| Assistant | |
| Paper Information | |
| Registration To | Component Parts and Materials (CPM) |
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| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Heteroepitaxial Growth of Bi_2Sr_2CuO_x thin films on Si(001) |
| Sub Title (in English) | |
| Keyword(1) | superconductor |
| Keyword(2) | thin film |
| Keyword(3) | MBE |
| Keyword(4) | Si |
| Keyword(5) | SrO |
| Keyword(6) | BiSrCuO |
| Keyword(7) | XRD |
| 1st Author's Name | Toyokazu TAMBO |
| 1st Author's Affiliation | Faculty of Engineering, Toyama University() |
| 2nd Author's Name | Atsushi SHIMIZU |
| 2nd Author's Affiliation | Faculty of Engineering, Toyama University |
| 3rd Author's Name | Akiyoshi MATSUDA |
| 3rd Author's Affiliation | Faculty of Engineering, Toyama University |
| 4th Author's Name | Chiei TATSUYAMA |
| 4th Author's Affiliation | Faculty of Engineering, Toyama University |
| Date | 2000/10/19 |
| Paper # | CPM2000-120 |
| Volume (vol) | vol.100 |
| Number (no) | 395 |
| Page | pp.pp.- |
| #Pages | 6 |
| Date of Issue | |