Presentation 2000/10/19
MBE growth of Si_<0.75>Ge_<0.25> Alloys Using Short-period(Si_m/Ge_n)_N Superlattices on Si(001) Substrate
M.M. Rahman, H. Matada, T. Tambo, C. Tatsuyama,
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Abstract(in Japanese) (See Japanese page)
Abstract(in English) Si_<0.75>Ge_<0.25> alloy layers were grown on Si(001)substrates by MBE process using step-by-step grown superlattices(Si_m/Ge_n)_N(SLs) as buffer layers. Residual strain, surface roughness and dislocations of the top alloy layers have been characterized by x-ray diffraction(XRD), atomic force microscopy(AFM) and cross-sectional transmission electron microscopy(XTEM), respectively. Insertion of 1-step(Si_<14>/Ge_1)_<20> SL buffer layer drastically decreases root-mean-squared(RMS) surface roughness. RMS roughness also changes when Ge is deposited from 1-monolayer mode to 2-monolayer mode. XTEM images verify that SL buffers help to relax the strain of the alloy layer by introducing dislocations in the buffer layers or deflect them in to the substrate.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) (Si_m/Ge_n)_N superlattice / Residual strain / surface roughness / Atomic force microscopy / MBE
Paper # CPM2000-119
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Committee CPM
Conference Date 2000/10/19(1days)
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Language ENG
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) MBE growth of Si_<0.75>Ge_<0.25> Alloys Using Short-period(Si_m/Ge_n)_N Superlattices on Si(001) Substrate
Sub Title (in English)
Keyword(1) (Si_m/Ge_n)_N superlattice
Keyword(2) Residual strain
Keyword(3) surface roughness
Keyword(4) Atomic force microscopy
Keyword(5) MBE
1st Author's Name M.M. Rahman
1st Author's Affiliation Department of Electrical and Electronic Engineering, Faculty of Engineering, Toyama University()
2nd Author's Name H. Matada
2nd Author's Affiliation Department of Electrical and Electronic Engineering, Faculty of Engineering, Toyama University
3rd Author's Name T. Tambo
3rd Author's Affiliation Department of Electrical and Electronic Engineering, Faculty of Engineering, Toyama University
4th Author's Name C. Tatsuyama
4th Author's Affiliation Department of Electrical and Electronic Engineering, Faculty of Engineering, Toyama University
Date 2000/10/19
Paper # CPM2000-119
Volume (vol) vol.100
Number (no) 395
Page pp.pp.-
#Pages 6
Date of Issue