| Presentation | 2000/5/12 Etching of silicon related materials using trifluoro-athetyl-fluoride gas Yoji Saito, Hirofumi Yamazaki, Isamu Mouri, |
|---|---|
| PDF Download Page | PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | We propose reactive gases, which can be easily decomposed, as the etching gas to avoid"greenhouse effects". In this report, the etching reaction between silicon and the trifluoro-athetyl-fluoride(CF_3COF)gas is demonstrated, using remote-plasma at room temperature. The etching reaction is significantly enhanced by the addition of oxygen and the remote-plasma-excitation. The etch rate of silicon and oxide by CF_3COF / O_2 is larger than that by CF_4 / O_2 and C_2F_6 / O_2 at the same O_2 content. According to the optical emission study, however, the density of excited fluorine decreases in the plasma by the added oxygen into the CF_3COF system. Photoelectron studies indicate that the major role of the additional oxygen is to remove the deposited fluorocarbon films from the surfaces. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | greenhouse effect / trifluoro athetyl fluoride / sillcon / dry etching / remote plasma |
| Paper # | ED2000-35, CPM2000-20, SDM2000-35 |
| Date of Issue |
| Conference Information | |
| Committee | CPM |
|---|---|
| Conference Date | 2000/5/12(1days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | |
| Chair | |
| Vice Chair | |
| Secretary | |
| Assistant | |
| Paper Information | |
| Registration To | Component Parts and Materials (CPM) |
|---|---|
| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Etching of silicon related materials using trifluoro-athetyl-fluoride gas |
| Sub Title (in English) | |
| Keyword(1) | greenhouse effect |
| Keyword(2) | trifluoro athetyl fluoride |
| Keyword(3) | sillcon |
| Keyword(4) | dry etching |
| Keyword(5) | remote plasma |
| 1st Author's Name | Yoji Saito |
| 1st Author's Affiliation | Department of Electrical Engineering and Electronics, Seikei University() |
| 2nd Author's Name | Hirofumi Yamazaki |
| 2nd Author's Affiliation | Department of Electrical Engineering and Electronics, Seikei University |
| 3rd Author's Name | Isamu Mouri |
| 3rd Author's Affiliation | Department of Electrical Engineering and Electronics, Seikei University |
| Date | 2000/5/12 |
| Paper # | ED2000-35, CPM2000-20, SDM2000-35 |
| Volume (vol) | vol.100 |
| Number (no) | 60 |
| Page | pp.pp.- |
| #Pages | 6 |
| Date of Issue | |