Presentation 2000/5/12
Growth characteristics of CdS layers on(100)GaAs by metalorganic vapor phase epitaxy
H.B.Samion H, Yasumitsu Tomita, Yusuke Masuda, Kazuhito Yasuda,
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Abstract(in Japanese) (See Japanese page)
Abstract(in English) Growth characteristics of CdS layers on(100)GaAs have been studied in MOVPE using dimethylcadmium(DMCd)and hydrogen sulphide(H_2S)as precursors. Grown layers showed cubic phase for growth temperature between 250 and 350℃ and mixed phase of cubic and hexagonal above 350℃. High quality cubic CdS layers were obtained by two-step growth procedure, where is the single crystal cubic CdS layers were grown at 300℃ as buffer layers, and second layers were grown on them at 450℃.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) MOVPE / growth characteristics / DMCd / H_2S / cubic CdS
Paper # ED2000-33, CPM2000-18, SDM2000-33
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Committee CPM
Conference Date 2000/5/12(1days)
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Registration To Component Parts and Materials (CPM)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Growth characteristics of CdS layers on(100)GaAs by metalorganic vapor phase epitaxy
Sub Title (in English)
Keyword(1) MOVPE
Keyword(2) growth characteristics
Keyword(3) DMCd
Keyword(4) H_2S
Keyword(5) cubic CdS
1st Author's Name H.B.Samion H
1st Author's Affiliation Department of Electrical and Computer Engineering Nagoya Institute of Technology()
2nd Author's Name Yasumitsu Tomita
2nd Author's Affiliation Department of Electrical and Computer Engineering Nagoya Institute of Technology
3rd Author's Name Yusuke Masuda
3rd Author's Affiliation Department of Electrical and Computer Engineering Nagoya Institute of Technology
4th Author's Name Kazuhito Yasuda
4th Author's Affiliation Department of Electrical and Computer Engineering Nagoya Institute of Technology
Date 2000/5/12
Paper # ED2000-33, CPM2000-18, SDM2000-33
Volume (vol) vol.100
Number (no) 60
Page pp.pp.-
#Pages 6
Date of Issue