| Presentation | 2000/5/12 Fabrication zinc oxide thin films by reactive sihilded vacuum arc ion plating Keisaku Kimura, Ryuichi Miyano, Hirofumi Takikawa, Tateki Sakakibara, |
|---|---|
| PDF Download Page | PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | Zinc oxide thin films were prepared on a borosilicate glass substrate by a steered and shielded reactive vacuum arc deposition method. The cathode spot was driven on a cathode surface using weak and strong permanent magnets, placed behind the cathode. The arc was operated at DC 30 A and the in-process pressure was varied from 0.1 to 5.0 Pa.All films had a strong ZnO(200)peak, indicating c-axis orientation. Highly transparent films in visual region were obtained at 0.5 and 3.0 Pa with both weak and strong magnets. With the strong magnet, elcetric resistivity varied from 10^<-3> to 15 Ω cm as the pressure increased. However, with the weak magnet, resistivity on the order of 10^<-3> Ω cm order was obtained over a wide pressure range of 0.1 to 1.0 Pa. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | vacuum are deposition / zinc oxide thin film / crystalline and optical properties / electric resistivity |
| Paper # | ED2000-29, CPM2000-14, SDM2000-29 |
| Date of Issue |
| Conference Information | |
| Committee | CPM |
|---|---|
| Conference Date | 2000/5/12(1days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | |
| Chair | |
| Vice Chair | |
| Secretary | |
| Assistant | |
| Paper Information | |
| Registration To | Component Parts and Materials (CPM) |
|---|---|
| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Fabrication zinc oxide thin films by reactive sihilded vacuum arc ion plating |
| Sub Title (in English) | |
| Keyword(1) | vacuum are deposition |
| Keyword(2) | zinc oxide thin film |
| Keyword(3) | crystalline and optical properties |
| Keyword(4) | electric resistivity |
| 1st Author's Name | Keisaku Kimura |
| 1st Author's Affiliation | Department of Electrical and Electronic Engineering Toyohashi University of Technology() |
| 2nd Author's Name | Ryuichi Miyano |
| 2nd Author's Affiliation | Department of Electrical and Electronic Engineering Toyohashi University of Technology |
| 3rd Author's Name | Hirofumi Takikawa |
| 3rd Author's Affiliation | Department of Electrical and Electronic Engineering Toyohashi University of Technology |
| 4th Author's Name | Tateki Sakakibara |
| 4th Author's Affiliation | Department of Electrical and Electronic Engineering Toyohashi University of Technology |
| Date | 2000/5/12 |
| Paper # | ED2000-29, CPM2000-14, SDM2000-29 |
| Volume (vol) | vol.100 |
| Number (no) | 60 |
| Page | pp.pp.- |
| #Pages | 6 |
| Date of Issue | |