Presentation 1999/5/20
Composition control of SiC thin films deposition using HMDS
T. Muramatsu, Y. Xu, T. Aoki, Y. Hatanaka,
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Abstract(in English) SiC thin films were deposited by plasma CVD method using hexamethyledisilane. It was found that when hydrogen was used for plasma gas, the cathode potential reduces because of flow of H+ ions toward the cathode. Cut off wave length of the deposited films sift toward higher wave length while increasing the amount of silane in HMDS. As a result, the film becomes yellowish, and the reason for this is under current study.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) Plasma CVD / Hexamethyldisilane / Silane / Cathode potential / SiC film
Paper # CPM99-11
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Conference Information
Committee CPM
Conference Date 1999/5/20(1days)
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Registration To Component Parts and Materials (CPM)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Composition control of SiC thin films deposition using HMDS
Sub Title (in English)
Keyword(1) Plasma CVD
Keyword(2) Hexamethyldisilane
Keyword(3) Silane
Keyword(4) Cathode potential
Keyword(5) SiC film
1st Author's Name T. Muramatsu
1st Author's Affiliation Research Institute of Electronics, Shizuoka University()
2nd Author's Name Y. Xu
2nd Author's Affiliation Graduate School of Electronic Science and Technology, Shizuoka University
3rd Author's Name T. Aoki
3rd Author's Affiliation Graduate School of Electronic Science and Technology, Shizuoka University
4th Author's Name Y. Hatanaka
4th Author's Affiliation Research Institute of Electronics:Graduate School of Electronic Science and Technology, Shizuoka University
Date 1999/5/20
Paper # CPM99-11
Volume (vol) vol.99
Number (no) 65
Page pp.pp.-
#Pages 6
Date of Issue