Presentation 1999/5/20
Application of TiO_2 film with optical catalyst to environment by Electron-Beam-Excited Plasma
Takanori Kubota, Ren Suzuki, Taishi Mutuga, Shinken Koh, Toshitaro Yoshioka, Keisuke Kida, Kiyohide Baba, Akira Nishiwaki, Shunjiro Ikezawa, Yoshihiko Ninomiya,
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Abstract(in Japanese) (See Japanese page)
Abstract(in English) As the application of EBEP (Electron-Beam-Excited Plasma) apparatus, we try to make many kinds of thin films. There is remarkable characteristic in EBEP; The electron-beam eneregy and density are controlled independently by accelerating voltage V_A and discharge current I_D, respectively. The film quality can be controlled by their variations. As an instance of them, TiO_2 films are formed by means of the electron-beam method, varying the V_A(80, 90, and 100V) and I_D(3, 4, and 5A). As a result, it is found that film color and their composition are controlled by V_A and deposition rate is controlled by I_D, And, TiO_2 film deposited on the filter of air conditioner will be tried in meter size EBEP as an application.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) EBEP Apparatus / TiO_2 film / Discharge current / Accelerating voltage
Paper # CPM99-2
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Conference Information
Committee CPM
Conference Date 1999/5/20(1days)
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Registration To Component Parts and Materials (CPM)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Application of TiO_2 film with optical catalyst to environment by Electron-Beam-Excited Plasma
Sub Title (in English)
Keyword(1) EBEP Apparatus
Keyword(2) TiO_2 film
Keyword(3) Discharge current
Keyword(4) Accelerating voltage
1st Author's Name Takanori Kubota
1st Author's Affiliation Collage of Engineering, Chubu University()
2nd Author's Name Ren Suzuki
2nd Author's Affiliation Collage of Engineering, Chubu University
3rd Author's Name Taishi Mutuga
3rd Author's Affiliation Collage of Engineering, Chubu University
4th Author's Name Shinken Koh
4th Author's Affiliation Collage of Engineering, Chubu University
5th Author's Name Toshitaro Yoshioka
5th Author's Affiliation Collage of Engineering, Chubu University
6th Author's Name Keisuke Kida
6th Author's Affiliation Collage of Engineering, Chubu University
7th Author's Name Kiyohide Baba
7th Author's Affiliation Collage of Engineering, Chubu University
8th Author's Name Akira Nishiwaki
8th Author's Affiliation Collage of Engineering, Chubu University
9th Author's Name Shunjiro Ikezawa
9th Author's Affiliation Collage of Engineering, Chubu University
10th Author's Name Yoshihiko Ninomiya
10th Author's Affiliation Collage of Engineering, Chubu University
Date 1999/5/20
Paper # CPM99-2
Volume (vol) vol.99
Number (no) 65
Page pp.pp.-
#Pages 8
Date of Issue