Presentation 1998/11/5
Fabrication of InGaAs Quantum Wires by Surface-Diffusion-Controlled Molecular Beam Epitaxy
Yasuhiko Tanuma, Takeyoshi Sugaya, Kenji Yonei, Tadashi Nakagawa, Mutsuo Ogura, Yoshinobu Sugiyama, Takashi Sekiguchi,
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Abstract(in English) InGaAs/InAlAs quantum wire structures on V-grooved InP substrates have been fabricated with As_2 flux and atomic hydrogen irradiation using molecular beam epitaxy. Under As_2 flux, the V-grooves are preserved during the InAlAs barrier layer growth due to a small migration of the In atoms, but the V-shape is not preserved and hence the quantum wires cannot be fabricated under an As_4 flux. The InGaAs quantum wires grown with atomic hydrogen have a narrow photoluminescence peak and a uniform cathode-luminescence image. These phenomena maybe caused by the absence of(311)A sidewall quantum wells due to re-evaporation of the group-III atoms by the atomic hydrogen irradiation. The field effect transistor with quantum wire channels demonstrated good saturation characteristics.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) molecular beam epitaxy(MBE) / InGaAs quantum wire / atomic hydrogen / selective growth / atomic hydrogen irradiation / surface diffusion control / FET
Paper # ED98-126,CPM98-129
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Conference Information
Committee CPM
Conference Date 1998/11/5(1days)
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Registration To Component Parts and Materials (CPM)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Fabrication of InGaAs Quantum Wires by Surface-Diffusion-Controlled Molecular Beam Epitaxy
Sub Title (in English)
Keyword(1) molecular beam epitaxy(MBE)
Keyword(2) InGaAs quantum wire
Keyword(3) atomic hydrogen
Keyword(4) selective growth
Keyword(5) atomic hydrogen irradiation
Keyword(6) surface diffusion control
Keyword(7) FET
1st Author's Name Yasuhiko Tanuma
1st Author's Affiliation Shibaura Institute of Technology()
2nd Author's Name Takeyoshi Sugaya
2nd Author's Affiliation Electrotechnical Laboratory
3rd Author's Name Kenji Yonei
3rd Author's Affiliation Shibaura Institute of Technology
4th Author's Name Tadashi Nakagawa
4th Author's Affiliation Electrotechnical Laboratory
5th Author's Name Mutsuo Ogura
5th Author's Affiliation Electrotechnical Laboratory
6th Author's Name Yoshinobu Sugiyama
6th Author's Affiliation Electrotechnical Laboratory
7th Author's Name Takashi Sekiguchi
7th Author's Affiliation Tohoku University
Date 1998/11/5
Paper # ED98-126,CPM98-129
Volume (vol) vol.98
Number (no) 385
Page pp.pp.-
#Pages 6
Date of Issue