Presentation | 1998/11/5 Fabrication of InGaAs Quantum Wires by Surface-Diffusion-Controlled Molecular Beam Epitaxy Yasuhiko Tanuma, Takeyoshi Sugaya, Kenji Yonei, Tadashi Nakagawa, Mutsuo Ogura, Yoshinobu Sugiyama, Takashi Sekiguchi, |
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Abstract(in Japanese) | (See Japanese page) |
Abstract(in English) | InGaAs/InAlAs quantum wire structures on V-grooved InP substrates have been fabricated with As_2 flux and atomic hydrogen irradiation using molecular beam epitaxy. Under As_2 flux, the V-grooves are preserved during the InAlAs barrier layer growth due to a small migration of the In atoms, but the V-shape is not preserved and hence the quantum wires cannot be fabricated under an As_4 flux. The InGaAs quantum wires grown with atomic hydrogen have a narrow photoluminescence peak and a uniform cathode-luminescence image. These phenomena maybe caused by the absence of(311)A sidewall quantum wells due to re-evaporation of the group-III atoms by the atomic hydrogen irradiation. The field effect transistor with quantum wire channels demonstrated good saturation characteristics. |
Keyword(in Japanese) | (See Japanese page) |
Keyword(in English) | molecular beam epitaxy(MBE) / InGaAs quantum wire / atomic hydrogen / selective growth / atomic hydrogen irradiation / surface diffusion control / FET |
Paper # | ED98-126,CPM98-129 |
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Conference Information | |
Committee | CPM |
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Conference Date | 1998/11/5(1days) |
Place (in Japanese) | (See Japanese page) |
Place (in English) | |
Topics (in Japanese) | (See Japanese page) |
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Assistant |
Paper Information | |
Registration To | Component Parts and Materials (CPM) |
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Language | JPN |
Title (in Japanese) | (See Japanese page) |
Sub Title (in Japanese) | (See Japanese page) |
Title (in English) | Fabrication of InGaAs Quantum Wires by Surface-Diffusion-Controlled Molecular Beam Epitaxy |
Sub Title (in English) | |
Keyword(1) | molecular beam epitaxy(MBE) |
Keyword(2) | InGaAs quantum wire |
Keyword(3) | atomic hydrogen |
Keyword(4) | selective growth |
Keyword(5) | atomic hydrogen irradiation |
Keyword(6) | surface diffusion control |
Keyword(7) | FET |
1st Author's Name | Yasuhiko Tanuma |
1st Author's Affiliation | Shibaura Institute of Technology() |
2nd Author's Name | Takeyoshi Sugaya |
2nd Author's Affiliation | Electrotechnical Laboratory |
3rd Author's Name | Kenji Yonei |
3rd Author's Affiliation | Shibaura Institute of Technology |
4th Author's Name | Tadashi Nakagawa |
4th Author's Affiliation | Electrotechnical Laboratory |
5th Author's Name | Mutsuo Ogura |
5th Author's Affiliation | Electrotechnical Laboratory |
6th Author's Name | Yoshinobu Sugiyama |
6th Author's Affiliation | Electrotechnical Laboratory |
7th Author's Name | Takashi Sekiguchi |
7th Author's Affiliation | Tohoku University |
Date | 1998/11/5 |
Paper # | ED98-126,CPM98-129 |
Volume (vol) | vol.98 |
Number (no) | 385 |
Page | pp.pp.- |
#Pages | 6 |
Date of Issue |