| Presentation | 1998/10/29 ITO films deposition examine with low temperature by sputtering R. Ohki, Y. Hoshi, |
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| PDF Download Page | PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | ITO thin films were deposited on acryl substrate by using a facing targets sputtering system. The films with a resistivity as low as 5×10^<-4>Ωcm were obtained by the sputtering, even if the sputtering voltage was higher than 500 V. An rf-dc coupled magnetron sputtering system was also used to deposit the film at a sputtering voltage below 100V. The resistivity of the film deposited by the magnetron sputtering decreased steeply as the sputtering voltage decreases from 300 V to 100 V, and the minimum resistivity was as low as 5×10^<-4>Ωcm. The smoothness of the film surface was also significantly improved by decreasing the sputtering voltage. These results indicate that the bombardment of high energy oxygen atoms to the film surface should be suppressed to obtain a film with low resisitivity. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | ITO film / rf-dc coupled magnetron sputtering / facing targets sputtering |
| Paper # | CPM98-115 |
| Date of Issue |
| Conference Information | |
| Committee | CPM |
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| Conference Date | 1998/10/29(1days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | |
| Chair | |
| Vice Chair | |
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| Paper Information | |
| Registration To | Component Parts and Materials (CPM) |
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| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | ITO films deposition examine with low temperature by sputtering |
| Sub Title (in English) | |
| Keyword(1) | ITO film |
| Keyword(2) | rf-dc coupled magnetron sputtering |
| Keyword(3) | facing targets sputtering |
| 1st Author's Name | R. Ohki |
| 1st Author's Affiliation | Faculty of Engineering, Tokyo Institute of Polytechnics() |
| 2nd Author's Name | Y. Hoshi |
| 2nd Author's Affiliation | Faculty of Engineering, Tokyo Institute of Polytechnics |
| Date | 1998/10/29 |
| Paper # | CPM98-115 |
| Volume (vol) | vol.98 |
| Number (no) | 376 |
| Page | pp.pp.- |
| #Pages | 7 |
| Date of Issue | |