Presentation | 1994/9/13 Diffusion behavior of the transition metal in the Cu/IVa- transition metal/Si contact system Mayumi Takeyama, Atsushi Noya, Katsutaka Sasaki, Hiroki Hatakeyama, |
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Abstract(in Japanese) | (See Japanese page) |
Abstract(in English) | The diffusion behavior taking place in the Cu, lVa Transition Metal/Si contact system has been examined using Auger electron spectroscopy(AES)and x-ray photoelectron spectroscopy(XPS)analyses. It is found that the diffusion of the transition metal toward the surface of the contact system is effectively suppressed by placing the thin transition metal layer at the surface of the Cu in the present system.Also,the transition metal as the overlayer is possible to decisive the surface oxidation of the Cu surface. |
Keyword(in Japanese) | (See Japanese page) |
Keyword(in English) | Cu metallization / diffusion behavior / transition metal / affinity for oxygen / surface oxidation |
Paper # | CPM94-68 |
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Conference Information | |
Committee | CPM |
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Conference Date | 1994/9/13(1days) |
Place (in Japanese) | (See Japanese page) |
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Topics (in Japanese) | (See Japanese page) |
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Paper Information | |
Registration To | Component Parts and Materials (CPM) |
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Language | JPN |
Title (in Japanese) | (See Japanese page) |
Sub Title (in Japanese) | (See Japanese page) |
Title (in English) | Diffusion behavior of the transition metal in the Cu/IVa- transition metal/Si contact system |
Sub Title (in English) | |
Keyword(1) | Cu metallization |
Keyword(2) | diffusion behavior |
Keyword(3) | transition metal |
Keyword(4) | affinity for oxygen |
Keyword(5) | surface oxidation |
1st Author's Name | Mayumi Takeyama |
1st Author's Affiliation | Department of Electrical and Electronic Engineering,Faculty of Engineering,Kitami Institute of Technology() |
2nd Author's Name | Atsushi Noya |
2nd Author's Affiliation | Department of Electrical and Electronic Engineering,Faculty of Engineering,Kitami Institute of Technology |
3rd Author's Name | Katsutaka Sasaki |
3rd Author's Affiliation | Department of Material Science,Faculty of Engineering,Kitami Institute of Technology |
4th Author's Name | Hiroki Hatakeyama |
4th Author's Affiliation | Department of Electrical and Electronic Engineering,Faculty of Engineering,Kitami Institute of Technology |
Date | 1994/9/13 |
Paper # | CPM94-68 |
Volume (vol) | vol.94 |
Number (no) | 227 |
Page | pp.pp.- |
#Pages | 6 |
Date of Issue |