Presentation | 1994/9/13 A study of interfacial reactions in Cu/metal/SiO_2/Si systems Hikaru Seki, Mayumi Takeyama, Atsushi Noya, Katsutaka Sasaki, Wataru Matsushita, |
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Abstract(in Japanese) | (See Japanese page) |
Abstract(in English) | The interfacial reactions taken place in the Cu, metal/SiO_2/Si systems(metal:Y,V,W)have been studied by the analytic techniques of AES and XPS.In the as-deposited specimen of the systems,the reduction of SiO_2 due to the oxidation of the metal deposited on the SiO_2 layer was observed according to ihe chemical affinity inherent in the metal.The interdiffusion and/or reaction at the interfaces in each system taken place due to the annealing,which lead to the deterioration of the systems by intermixing of elements at 250℃ for Cu/Y/SiO_2/Si,at 600℃ for Cu/V/SiO_2/Si and at 800℃ for Cu/W/SiO_2/Si system.The intermixing took place in loc al site for W barrier and in a uniform fashion for the others. |
Keyword(in Japanese) | (See Japanese page) |
Keyword(in English) | Cu metallization / metal/iO_2 interface / Cu/etal interface / reduction reaction / Pauling′s electronegativity / heat of forma tion |
Paper # | CPM94-67 |
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Conference Information | |
Committee | CPM |
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Conference Date | 1994/9/13(1days) |
Place (in Japanese) | (See Japanese page) |
Place (in English) | |
Topics (in Japanese) | (See Japanese page) |
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Paper Information | |
Registration To | Component Parts and Materials (CPM) |
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Language | JPN |
Title (in Japanese) | (See Japanese page) |
Sub Title (in Japanese) | (See Japanese page) |
Title (in English) | A study of interfacial reactions in Cu/metal/SiO_2/Si systems |
Sub Title (in English) | |
Keyword(1) | Cu metallization |
Keyword(2) | metal/iO_2 interface |
Keyword(3) | Cu/etal interface |
Keyword(4) | reduction reaction |
Keyword(5) | Pauling′s electronegativity |
Keyword(6) | heat of forma tion |
1st Author's Name | Hikaru Seki |
1st Author's Affiliation | Department of Electrical and Electronic Engineering,Faculty of Engineering,Kitami Institute of Technology() |
2nd Author's Name | Mayumi Takeyama |
2nd Author's Affiliation | Department of Electrical and Electronic Engineering,Faculty of Engineering,Kitami Institute of Technology |
3rd Author's Name | Atsushi Noya |
3rd Author's Affiliation | Department of Electrical and Electronic Engineering,Faculty of Engineering,Kitami Institute of Technology |
4th Author's Name | Katsutaka Sasaki |
4th Author's Affiliation | Department of Material Science,Faculty of Engineering,Kitami Institute of Technology |
5th Author's Name | Wataru Matsushita |
5th Author's Affiliation | Department of Electrical and Electronic Engineering,Faculty of Engineering,Kitami Institute of Technology |
Date | 1994/9/13 |
Paper # | CPM94-67 |
Volume (vol) | vol.94 |
Number (no) | 227 |
Page | pp.pp.- |
#Pages | 6 |
Date of Issue |