Presentation | 1994/9/12 The first nucleation of metal-rich silicide in the interfacial reaction in Nb/Si systems Taichi Nakanishi, Yoshitaka Murakami, Mayumi Takeyama, Atsushi Noya, Katsutaka Sasaki, |
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Abstract(in Japanese) | (See Japanese page) |
Abstract(in English) | The interfacial reaction in the Nb, Si system has been studied by x-ray diffraction(XRD)and Auger electron spectroscopy(AES).The metal-rich phase of Nb_3Si is formed as a first nucleated phase by the interfacial reaction in the systems at the heat treatment temperature of 550℃.Subsequently NbSi_3 in addition to Nb_3Si is f ormed after heat treatment at 600℃.The growth of the NbSi_2 phase by the out-diffusion of Si is observed at heat treatment temperatures above 650℃,and simultaneous occurrence of multiphases which consists of Nb_3Si,Nb_5Si_3 and NbSi_2 is observed at the heat treatment temperature of 650℃.The metalrich phase of Nb_3Si a nd Nb_5Si_3 are completely overcome by the formation of the NbSi_2 phase by the out-diffusion of Si at the heat treatment temperature of 700℃. |
Keyword(in Japanese) | (See Japanese page) |
Keyword(in English) | Nb-silicide / interfacial reaction / first nucleated phase / multiphase / metal-rich phase / duffusing species |
Paper # | CPM94-64 |
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Conference Information | |
Committee | CPM |
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Conference Date | 1994/9/12(1days) |
Place (in Japanese) | (See Japanese page) |
Place (in English) | |
Topics (in Japanese) | (See Japanese page) |
Topics (in English) | |
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Paper Information | |
Registration To | Component Parts and Materials (CPM) |
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Language | JPN |
Title (in Japanese) | (See Japanese page) |
Sub Title (in Japanese) | (See Japanese page) |
Title (in English) | The first nucleation of metal-rich silicide in the interfacial reaction in Nb/Si systems |
Sub Title (in English) | |
Keyword(1) | Nb-silicide |
Keyword(2) | interfacial reaction |
Keyword(3) | first nucleated phase |
Keyword(4) | multiphase |
Keyword(5) | metal-rich phase |
Keyword(6) | duffusing species |
1st Author's Name | Taichi Nakanishi |
1st Author's Affiliation | Department of Electrical and Electronic Engineering,Faculty of Engineering,Kitami Institute of Technology() |
2nd Author's Name | Yoshitaka Murakami |
2nd Author's Affiliation | Department of Electrical and Electronic Engineering,Faculty of Engineering,Kitami Institute of Technology |
3rd Author's Name | Mayumi Takeyama |
3rd Author's Affiliation | Department of Electrical and Electronic Engineering,Faculty of Engineering,Kitami Institute of Technology |
4th Author's Name | Atsushi Noya |
4th Author's Affiliation | Department of Electrical and Electronic Engineering,Faculty of Engineering,Kitami Institute of Technology |
5th Author's Name | Katsutaka Sasaki |
5th Author's Affiliation | Department of Material Science,Faculty of Engineering,Kitami Institute of Technology |
Date | 1994/9/12 |
Paper # | CPM94-64 |
Volume (vol) | vol.94 |
Number (no) | 226 |
Page | pp.pp.- |
#Pages | 6 |
Date of Issue |