Presentation 1993/9/17
Step coverage simulation of molybdenum silicide sputtering films
Toshinari Yamazaki, Nagayasu Ikeda, Keiro Sugimoto,
PDF Download Page PDF download Page Link
Abstract(in Japanese) (See Japanese page)
Abstract(in English) Step coverage calculation of molybdenum silicide films was carried out using a model constructed by modifying the string model often used for the calculation of aluminium film step coverage.In the model,the angular distributions of sputtered Mo and Si atoms were considered and,resultantly,the film composition around steps as well as the thickness could be calculated.It was concluded that the difference between the angular distribution of Mo atoms and that of Si atoms caused the deviation of the film composition around steps from that at flat surface.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) step coverage / molybdenum silicide / sputtering / thin film / angular distribution
Paper # CPM93-70
Date of Issue

Conference Information
Committee CPM
Conference Date 1993/9/17(1days)
Place (in Japanese) (See Japanese page)
Place (in English)
Topics (in Japanese) (See Japanese page)
Topics (in English)
Chair
Vice Chair
Secretary
Assistant

Paper Information
Registration To Component Parts and Materials (CPM)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Step coverage simulation of molybdenum silicide sputtering films
Sub Title (in English)
Keyword(1) step coverage
Keyword(2) molybdenum silicide
Keyword(3) sputtering
Keyword(4) thin film
Keyword(5) angular distribution
1st Author's Name Toshinari Yamazaki
1st Author's Affiliation Faculty of Engineering,Toyama University()
2nd Author's Name Nagayasu Ikeda
2nd Author's Affiliation Faculty of Engineering,Toyama University
3rd Author's Name Keiro Sugimoto
3rd Author's Affiliation Faculty of Education,Toyama University
Date 1993/9/17
Paper # CPM93-70
Volume (vol) vol.93
Number (no) 223
Page pp.pp.-
#Pages 6
Date of Issue