Presentation 1993/9/16
Principle and recent progress of graphoepitaxy technology
Hideyuki Takakura, Yoshiaki Wakabayashi, Yoshihiro Hamakawa,
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Abstract(in English) A systematic experimental approach has been performed to achieve orientation-controlled nucleation and graphoepitaxial growth of germanium on the replica substrate with a textured single- crystarme silicon(001)substrate.The graphoepitaxial growth was performed from a germanium, metal eutectic alloy solution with an appropriate recrystallization.This technology will realize a wide area single crystalline thin film substrates for applications to solar cells and display devices.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) Graphoepitaxy / Germanium / Solar Cells / entectic alloy / thin tilm
Paper # CPM93-65
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Committee CPM
Conference Date 1993/9/16(1days)
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Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Principle and recent progress of graphoepitaxy technology
Sub Title (in English)
Keyword(1) Graphoepitaxy
Keyword(2) Germanium
Keyword(3) Solar Cells
Keyword(4) entectic alloy
Keyword(5) thin tilm
1st Author's Name Hideyuki Takakura
1st Author's Affiliation Faculty of Engineering,Toyama Prefectural University()
2nd Author's Name Yoshiaki Wakabayashi
2nd Author's Affiliation Faculty of Engineering Science,Osaka University
3rd Author's Name Yoshihiro Hamakawa
3rd Author's Affiliation Faculty of Engineering Science,Osaka University
Date 1993/9/16
Paper # CPM93-65
Volume (vol) vol.93
Number (no) 222
Page pp.pp.-
#Pages 6
Date of Issue