Presentation | 1993/9/16 Principle and recent progress of graphoepitaxy technology Hideyuki Takakura, Yoshiaki Wakabayashi, Yoshihiro Hamakawa, |
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Abstract(in Japanese) | (See Japanese page) |
Abstract(in English) | A systematic experimental approach has been performed to achieve orientation-controlled nucleation and graphoepitaxial growth of germanium on the replica substrate with a textured single- crystarme silicon(001)substrate.The graphoepitaxial growth was performed from a germanium, metal eutectic alloy solution with an appropriate recrystallization.This technology will realize a wide area single crystalline thin film substrates for applications to solar cells and display devices. |
Keyword(in Japanese) | (See Japanese page) |
Keyword(in English) | Graphoepitaxy / Germanium / Solar Cells / entectic alloy / thin tilm |
Paper # | CPM93-65 |
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Committee | CPM |
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Conference Date | 1993/9/16(1days) |
Place (in Japanese) | (See Japanese page) |
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Registration To | Component Parts and Materials (CPM) |
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Language | JPN |
Title (in Japanese) | (See Japanese page) |
Sub Title (in Japanese) | (See Japanese page) |
Title (in English) | Principle and recent progress of graphoepitaxy technology |
Sub Title (in English) | |
Keyword(1) | Graphoepitaxy |
Keyword(2) | Germanium |
Keyword(3) | Solar Cells |
Keyword(4) | entectic alloy |
Keyword(5) | thin tilm |
1st Author's Name | Hideyuki Takakura |
1st Author's Affiliation | Faculty of Engineering,Toyama Prefectural University() |
2nd Author's Name | Yoshiaki Wakabayashi |
2nd Author's Affiliation | Faculty of Engineering Science,Osaka University |
3rd Author's Name | Yoshihiro Hamakawa |
3rd Author's Affiliation | Faculty of Engineering Science,Osaka University |
Date | 1993/9/16 |
Paper # | CPM93-65 |
Volume (vol) | vol.93 |
Number (no) | 222 |
Page | pp.pp.- |
#Pages | 6 |
Date of Issue |