Presentation 1995/8/4
PROPERTIES OF DIAMOND LIKE CARBON FILMS DEPOSITED BY SPUTTERING IN Ar AND O_2 MIXTURE
Y. Hoshi, A. Suzuki, H. J. Judy,
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Abstract(in Japanese) (See Japanese page)
Abstract(in English) In order to improve protective properties of diamond like carbon films, we deposited the carbon films by sputtering in Ar+O_2 mixture. The film deposition rate changed little with the O_2 gas ratio in the sputtering gas when the sputtering was performed at the oxygen gas ratio below 50%. However, it decreased steeply as the oxygen gas ratio increased above 60%. The carbon films deposited in the Ar+O_2 mixture contain oxygen. The structure of the film became porous and adhesion of the film between the substrate became poor as the oxygen gas ratio increased. The increase in the oxygen gas ratio in the sputtering gas leads to a remarkable increase in Vicker's hardness and resistivity of the film, and leads to a decrease in its refractive index and extinction coefficient.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) diamond like carbon film / sputtering / protective coating / oxygen added carbon / Vicker's hardness
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Committee CPM
Conference Date 1995/8/4(1days)
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Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) PROPERTIES OF DIAMOND LIKE CARBON FILMS DEPOSITED BY SPUTTERING IN Ar AND O_2 MIXTURE
Sub Title (in English)
Keyword(1) diamond like carbon film
Keyword(2) sputtering
Keyword(3) protective coating
Keyword(4) oxygen added carbon
Keyword(5) Vicker's hardness
1st Author's Name Y. Hoshi
1st Author's Affiliation Faculty of Engineering, Tokyo Institute of Polytechnics()
2nd Author's Name A. Suzuki
2nd Author's Affiliation Recording and Imaging Science Laboratory, Kao Corporation
3rd Author's Name H. J. Judy
3rd Author's Affiliation The Center for Micromagnetics and Information Technologies, University of Minnesota
Date 1995/8/4
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Volume (vol) vol.95
Number (no) 204
Page pp.pp.-
#Pages 6
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