Presentation 1995/10/20
Cu/Benzocyclobutene Thin-Film Multilayer Technology
Tadanori SHIMOTO, Koji MATSUI, Yuzo SHIMADA, Kauzuaki UTSUMI,
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Abstract(in Japanese) (See Japanese page)
Abstract(in English) This paper describes a Cu/Bmenzocyclobutene (BCB) thin-film multilayer technology which enables reliable fabrication of high-performance and low cost applications. The technology has the advantages of Cu conductor with no adhesion/barrier metal layer, excellent planarization, and low processing temperature. A prototype module fabricated with the technology passed all the long-term reliability test that is required for real operation .
Keyword(in Japanese) (See Japanese page)
Keyword(in English) Benzocyclobutene / Photosensitive / Cu Conductor / Multilayer / MCM / MCM-D
Paper # CPM95-77
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Conference Information
Committee CPM
Conference Date 1995/10/20(1days)
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Registration To Component Parts and Materials (CPM)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Cu/Benzocyclobutene Thin-Film Multilayer Technology
Sub Title (in English)
Keyword(1) Benzocyclobutene
Keyword(2) Photosensitive
Keyword(3) Cu Conductor
Keyword(4) Multilayer
Keyword(5) MCM
Keyword(6) MCM-D
1st Author's Name Tadanori SHIMOTO
1st Author's Affiliation Material Development Center, NEC Corporation()
2nd Author's Name Koji MATSUI
2nd Author's Affiliation Material Development Center, NEC Corporation
3rd Author's Name Yuzo SHIMADA
3rd Author's Affiliation Material Development Center, NEC Corporation
4th Author's Name Kauzuaki UTSUMI
4th Author's Affiliation Material Development Center, NEC Corporation
Date 1995/10/20
Paper # CPM95-77
Volume (vol) vol.95
Number (no) 332
Page pp.pp.-
#Pages 6
Date of Issue