Presentation 1996/6/21
Dependence of gas sensitivity on micro-structures in SnO_2 thin films deposited by RF-sputtering
Akira Kunimoto, Haruka Tamura, Yukio Nakanouchi,
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Abstract(in Japanese) (See Japanese page)
Abstract(in English) The influence of RF-Sputtering conditions on the micro-structures in SnO_2 thin films were investigated, and the mechanism of gas sensitivity in that was studied. As a result, the micro-structure (morphology) of SnO_2 thin films were well affected by sputtering gas pressures. In this case, the granular size of SnO_2 and distance between each other increased as the pressure was increased. Moreover post-annealing for the films accelerated that tendancy. For the gas sensitivity, the more porous the film structure was, the higher the sensitivity was. However the gas response time was just opposite to that. From these results, the sensitivity in SnO_2 thin films remarkably depends on the film porosity and diffusivity into the films.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) Gas-sensor / SnO_2 / Thin film / Sputtering / Micro-structure / Gas-sensitivity
Paper # CPM96-29,OME96-16
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Committee CPM
Conference Date 1996/6/21(1days)
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Registration To Component Parts and Materials (CPM)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Dependence of gas sensitivity on micro-structures in SnO_2 thin films deposited by RF-sputtering
Sub Title (in English)
Keyword(1) Gas-sensor
Keyword(2) SnO_2
Keyword(3) Thin film
Keyword(4) Sputtering
Keyword(5) Micro-structure
Keyword(6) Gas-sensitivity
1st Author's Name Akira Kunimoto
1st Author's Affiliation Technological Research Center, Riken Corporation()
2nd Author's Name Haruka Tamura
2nd Author's Affiliation Technological Research Center, Riken Corporation
3rd Author's Name Yukio Nakanouchi
3rd Author's Affiliation Technological Research Center, Riken Corporation
Date 1996/6/21
Paper # CPM96-29,OME96-16
Volume (vol) vol.96
Number (no) 121
Page pp.pp.-
#Pages 6
Date of Issue