Presentation 1997/8/21
Fabrication of slant Si films and application to a walk-off polarizer with wide apertures
Tomoyuki Aoyagi, Isamu Ito, Kazuo Shiraishi,
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Abstract(in Japanese) (See Japanese page)
Abstract(in English) We fabricated Si films composed of slant microcolumns, and have obtained much larger beam-splitting angles. Previously, we fabricated Ta_2O_5 films with wide apertures and confirmed the principal operation as a walk-off polarizer, but the polarization-splitting angle was small. To attain the large polarization-splitting angle, we chose Si as the material of films. Films that have a microcolumnar orientation angle as large as 58° is obtained by evaporating Si at a large angle of vapor-beam incidence. The measured polarization-splitting angle of the sample is 20° at the wavelength 1.55μm, which is 3.5 times larger than that of rutile or calcite.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) walk-off polarizer / columnar structure / silicon / oblique deposition
Paper # CPM97-72
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Committee CPM
Conference Date 1997/8/21(1days)
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Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Fabrication of slant Si films and application to a walk-off polarizer with wide apertures
Sub Title (in English)
Keyword(1) walk-off polarizer
Keyword(2) columnar structure
Keyword(3) silicon
Keyword(4) oblique deposition
1st Author's Name Tomoyuki Aoyagi
1st Author's Affiliation Faculty of Engineering Utsunomiya University()
2nd Author's Name Isamu Ito
2nd Author's Affiliation SHINCRON Co., Ltd.
3rd Author's Name Kazuo Shiraishi
3rd Author's Affiliation Faculty of Engineering Utsunomiya University
Date 1997/8/21
Paper # CPM97-72
Volume (vol) vol.97
Number (no) 233
Page pp.pp.-
#Pages 6
Date of Issue