Presentation 1993/9/21
Characterization of Coupled Microstrip Lines with protective Film
Shoichiro Yamaguchi, Kazuhiko Atsuki, Keren Li,
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Abstract(in English) Protective films such as SiO_2 are usually used to the protection of the devices and the transmiission lines in monolithic microwave integrated circuits(MMIC′s).And thin polymide films on GaAs substrate are also proposed to construct the multi- layered MMIC′s.These protective films(dielectric films)have a stro ng influence on the characteristics of the coupled microstrip lines used in MMIC′s,and the influence need to be analyzed for the accurate design.In this paper,we present an analysis of the coupled microstrip lines covered with the protective film.The analysis method applied the partial boundary integral equation method(PBIEM).The numerical results demonstlate that the protective films give a strong influence on the characteristics of the coupled lines when the conducting stripsare thick and the gap between the two strips are small.
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Keyword(in English) MMIC / coupled microstrip line / protective film / integral equation / partial boundary integral equation method
Paper # SAT93-44,MW93-58
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Conference Date 1993/9/21(1days)
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Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Characterization of Coupled Microstrip Lines with protective Film
Sub Title (in English)
Keyword(1) MMIC
Keyword(2) coupled microstrip line
Keyword(3) protective film
Keyword(4) integral equation
Keyword(5) partial boundary integral equation method
1st Author's Name Shoichiro Yamaguchi
1st Author's Affiliation The University of Electro-communications()
2nd Author's Name Kazuhiko Atsuki
2nd Author's Affiliation The University of Electro-communications
3rd Author's Name Keren Li
3rd Author's Affiliation The University of Electro-communications
Date 1993/9/21
Paper # SAT93-44,MW93-58
Volume (vol) vol.93
Number (no) 242
Page pp.pp.-
#Pages 8
Date of Issue