Presentation 1994/11/18
Electromigration Lifetime of Interconection with Via
Shinji Nakano, Tetsuaki Wada,
PDF Download Page PDF download Page Link
Abstract(in Japanese) (See Japanese page)
Abstract(in English) The dependence of electromigration(EM)lifetime on metal stepcoverage were investigated by two kinds of test patterns.Via chain pattern and the simulated product's pattern with via were compared.Three different types of samples for the stepcoverage at via were used in each pattern.The stepcoverage at via was improved by appling hot sputter and wet & dry etcfiing. As a result of investigation,the following facts were found.In the test of via chain,the EM lifetime strongly depends on metal stepcoverage at via.On the other hand,in the case of the simulated product's pattern with via,the EM lifetime is not related to the metal stepcoverage at via.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) electromigration / via hole / stepcoverage / multi-layered interconnects
Paper # R94-42
Date of Issue

Conference Information
Committee R
Conference Date 1994/11/18(1days)
Place (in Japanese) (See Japanese page)
Place (in English)
Topics (in Japanese) (See Japanese page)
Topics (in English)
Chair
Vice Chair
Secretary
Assistant

Paper Information
Registration To Reliability(R)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Electromigration Lifetime of Interconection with Via
Sub Title (in English)
Keyword(1) electromigration
Keyword(2) via hole
Keyword(3) stepcoverage
Keyword(4) multi-layered interconnects
1st Author's Name Shinji Nakano
1st Author's Affiliation Matsushita Electronics Corporation()
2nd Author's Name Tetsuaki Wada
2nd Author's Affiliation Matsushita Electronics Corporation
Date 1994/11/18
Paper # R94-42
Volume (vol) vol.94
Number (no) 352
Page pp.pp.-
#Pages 6
Date of Issue