Presentation 1995/12/15
Reliability Design Method for EM Failure in Aluminum Interconnects of LSIs
Kazunori HIRAOKA, Tadanobu NIKAIDO,
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Abstract(in English) Flexible design method for the reliability concerning with the electro-migration (EM) failure in aluminum interconnects of LSIs is proposed. The obtained design rule can satisfy the requirements of lifetime (25 years) and failure rate (200 FIT) without the excess restriction of current density. The equation for the design is induced using the acceleration factor between the test condition and the operating condition, in consideration of the statistical difference between the test sample and the LSI. The design rules are represented using the maps, which make the design change simple. In addition, the error of the reliability estimation is analyzed.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) LSI / Reliability / Interconnects / Electromigration (EM) / Failure / design
Paper # R95-31
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Committee R
Conference Date 1995/12/15(1days)
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Registration To Reliability(R)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Reliability Design Method for EM Failure in Aluminum Interconnects of LSIs
Sub Title (in English)
Keyword(1) LSI
Keyword(2) Reliability
Keyword(3) Interconnects
Keyword(4) Electromigration (EM)
Keyword(5) Failure
Keyword(6) design
1st Author's Name Kazunori HIRAOKA
1st Author's Affiliation NTT LSI Laboratories()
2nd Author's Name Tadanobu NIKAIDO
2nd Author's Affiliation NTT LSI Laboratories
Date 1995/12/15
Paper # R95-31
Volume (vol) vol.95
Number (no) 432
Page pp.pp.-
#Pages 6
Date of Issue