Presentation | 1995/12/15 Reliability Design Method for EM Failure in Aluminum Interconnects of LSIs Kazunori HIRAOKA, Tadanobu NIKAIDO, |
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Abstract(in Japanese) | (See Japanese page) |
Abstract(in English) | Flexible design method for the reliability concerning with the electro-migration (EM) failure in aluminum interconnects of LSIs is proposed. The obtained design rule can satisfy the requirements of lifetime (25 years) and failure rate (200 FIT) without the excess restriction of current density. The equation for the design is induced using the acceleration factor between the test condition and the operating condition, in consideration of the statistical difference between the test sample and the LSI. The design rules are represented using the maps, which make the design change simple. In addition, the error of the reliability estimation is analyzed. |
Keyword(in Japanese) | (See Japanese page) |
Keyword(in English) | LSI / Reliability / Interconnects / Electromigration (EM) / Failure / design |
Paper # | R95-31 |
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Conference Information | |
Committee | R |
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Conference Date | 1995/12/15(1days) |
Place (in Japanese) | (See Japanese page) |
Place (in English) | |
Topics (in Japanese) | (See Japanese page) |
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Paper Information | |
Registration To | Reliability(R) |
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Language | JPN |
Title (in Japanese) | (See Japanese page) |
Sub Title (in Japanese) | (See Japanese page) |
Title (in English) | Reliability Design Method for EM Failure in Aluminum Interconnects of LSIs |
Sub Title (in English) | |
Keyword(1) | LSI |
Keyword(2) | Reliability |
Keyword(3) | Interconnects |
Keyword(4) | Electromigration (EM) |
Keyword(5) | Failure |
Keyword(6) | design |
1st Author's Name | Kazunori HIRAOKA |
1st Author's Affiliation | NTT LSI Laboratories() |
2nd Author's Name | Tadanobu NIKAIDO |
2nd Author's Affiliation | NTT LSI Laboratories |
Date | 1995/12/15 |
Paper # | R95-31 |
Volume (vol) | vol.95 |
Number (no) | 432 |
Page | pp.pp.- |
#Pages | 6 |
Date of Issue |