Presentation 1997/10/30
Study on LSIs Aluminum interconnection of evaluation methods
Shigeki Kikui, Kenji Sugimoto, Kazuhiro Matsuzaki, Sumio Matsuda,
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Abstract(in English) To apply commercial LSIs which are fabricated with half-micron design rule, one of the most serious problems on reliability is the evaluation method of its Electromigration in Aluminum interconnection. We researched and study on Electromigration evaluation methods of LSIs Aluminum interconnection. In this paper, we studied the evaluation factors on manufacturing process.
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Keyword(in English) Electromigration
Paper # R97-14
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Committee R
Conference Date 1997/10/30(1days)
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Language JPN
Title (in Japanese) (See Japanese page)
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Title (in English) Study on LSIs Aluminum interconnection of evaluation methods
Sub Title (in English)
Keyword(1) Electromigration
1st Author's Name Shigeki Kikui
1st Author's Affiliation National Space Development Agency of Japan()
2nd Author's Name Kenji Sugimoto
2nd Author's Affiliation National Space Development Agency of Japan
3rd Author's Name Kazuhiro Matsuzaki
3rd Author's Affiliation National Space Development Agency of Japan
4th Author's Name Sumio Matsuda
4th Author's Affiliation National Space Development Agency of Japan
Date 1997/10/30
Paper # R97-14
Volume (vol) vol.97
Number (no) 351
Page pp.pp.-
#Pages 6
Date of Issue