Presentation 2000/8/18
EMD2000-43 / CPM2000-58 / OPE2000-55 / LQE2000-49 Fabrication of low loss laminated polarization splitters comprising consists of poly-silicon and silica layers
Haruhiko HORIE, Kouichi MURO, Hidehiko YODA, Kazuo SHIRAISHI,
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Abstract(in English) We investigated the fabrication process for low-loss laminated polarization splitters that consist of alternately laminated poly-Si and silica layers having a beam-splitting angle of more than 20゜. Deposition conditions in the rf sputtering process, such as substrate temperature, film thickness per layer, and Ar gas pressure are investigated. We found the optimum deposition condition that serves to reduce losses due to absorption and scattering. As the result, alow-loss multilayer film that has an optical loss of 0.24dB/100μm has been obtained.
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Keyword(in English) laminated polarization splitters / poly-silicon / multilayer films / sputtering
Paper # EMD2000-43,CPM2000-58,OPE2000-55,LQE2000-49
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Committee EMD
Conference Date 2000/8/18(1days)
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Registration To Electromechanical Devices (EMD)
Language JPN
Title (in Japanese) (See Japanese page)
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Title (in English) EMD2000-43 / CPM2000-58 / OPE2000-55 / LQE2000-49 Fabrication of low loss laminated polarization splitters comprising consists of poly-silicon and silica layers
Sub Title (in English)
Keyword(1) laminated polarization splitters
Keyword(2) poly-silicon
Keyword(3) multilayer films
Keyword(4) sputtering
1st Author's Name Haruhiko HORIE
1st Author's Affiliation Faculty of Engineering, Utsunomiya University()
2nd Author's Name Kouichi MURO
2nd Author's Affiliation Faculty of Engineering, Utsunomiya University
3rd Author's Name Hidehiko YODA
3rd Author's Affiliation Faculty of Engineering, Utsunomiya University
4th Author's Name Kazuo SHIRAISHI
4th Author's Affiliation Faculty of Engineering, Utsunomiya University
Date 2000/8/18
Paper # EMD2000-43,CPM2000-58,OPE2000-55,LQE2000-49
Volume (vol) vol.100
Number (no) 258
Page pp.pp.-
#Pages 6
Date of Issue