Presentation 1998/11/20
A study of contact resistance for surface condition.
Masafumi SUZUKI, Makito MORII, Osamu HAYASHI,
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Abstract(in Japanese) (See Japanese page)
Abstract(in English) When reduce a contact pressure a reliance of contact is influenced by contamination for contact. We studied for contact resistance of a contact surface condition, by electric analyzer. A thin organic contamination and a copper for contact base existed on the contact surface. We confirmed influence of contamination there are bad influence for contact resistance when low contact pressure.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) contact / contact resistance / analyzer / inorganic film / surface
Paper # EMD98-68
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Conference Information
Committee EMD
Conference Date 1998/11/20(1days)
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Paper Information
Registration To Electromechanical Devices (EMD)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) A study of contact resistance for surface condition.
Sub Title (in English)
Keyword(1) contact
Keyword(2) contact resistance
Keyword(3) analyzer
Keyword(4) inorganic film
Keyword(5) surface
1st Author's Name Masafumi SUZUKI
1st Author's Affiliation OMRON Corporation Production Technology Development DEPT.Section2 Production Management Division C&C Components Division HQ()
2nd Author's Name Makito MORII
2nd Author's Affiliation OMRON Corporation Production Technology Development DEPT.Section2 Production Management Division C&C Components Division HQ
3rd Author's Name Osamu HAYASHI
3rd Author's Affiliation OMRON Corporation Production Technology Development DEPT.Section2 Production Management Division C&C Components Division HQ
Date 1998/11/20
Paper # EMD98-68
Volume (vol) vol.98
Number (no) 428
Page pp.pp.-
#Pages 6
Date of Issue