Presentation	1996/12/20 A study of Fritting by the Pulse Current Method Yoshitada WATANABE,
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Abstract(in English)	Fritting was explained in detail by R.Holm. However, many factors remain unclear. Determining the causes of this phenomenon is necessary for preventing electrical noises. In this study, we discussed whether the phenomenon is attributable to the Joule heat generated by the current at a contact spot or the voltage applied between contacts. In addition to the conventional constant current method, we attempted a new method that uses a pulse current to check the influence of Joule heat. In our test using a copper oxide film, the fritting voltage was 0.1V at a constant current but 0.6V at a pulse current. Using this test, we determined that the fritting phenomenon is strongly attributable to a thermal factor.
Keyword(in Japanese)	(See Japanese page)
Keyword(in English)	Fritting phenomena / copper oxide film / fritting voltage / constant current method / pulse current method
Paper #	EMD96-85
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Conference Information
Committee	EMD
Conference Date	1996/12/20(1days)
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Paper Information
Registration To	Electromechanical Devices (EMD)
Language	JPN
Title (in Japanese)	(See Japanese page)
Sub Title (in Japanese)	(See Japanese page)
Title (in English)	A study of Fritting by the Pulse Current Method
Sub Title (in English)
Keyword(1)	Fritting phenomena
Keyword(2)	copper oxide film
Keyword(3)	fritting voltage
Keyword(4)	constant current method
Keyword(5)	pulse current method
1st Author's Name	Yoshitada WATANABE
1st Author's Affiliation	Department of Electrical Engineering, Faculty of Engineering. Kogakuin University()
Date	1996/12/20
Paper #	EMD96-85
Volume (vol)	vol.96
Number (no)	438
Page	pp.pp.-
#Pages	6
Date of Issue