Presentation 1997/4/18
Fabrication of LIGA Mask Based on a Silicon IC-Process
Kenichiro Suzuki,
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Abstract(in Japanese) (See Japanese page)
Abstract(in English) A well-defined x-ray mask which consists of a set of 10μm thick gold absorber patterns and a membrane with a low tensile stress is required for LIGA process. We have fabricated a LIGA mask by using a silicon IC-process, while paying a careful attention on dust and contamination problems occurred during the process. In the paper, polysilicon stress control and fabrication of gold absorber patterns with a high aspect ratio are described in details.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) LIGA process / X-ray mask / high-aspect-ratio pattern / Micromachining
Paper # EMD97-4
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Conference Information
Committee EMD
Conference Date 1997/4/18(1days)
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Paper Information
Registration To Electromechanical Devices (EMD)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Fabrication of LIGA Mask Based on a Silicon IC-Process
Sub Title (in English)
Keyword(1) LIGA process
Keyword(2) X-ray mask
Keyword(3) high-aspect-ratio pattern
Keyword(4) Micromachining
1st Author's Name Kenichiro Suzuki
1st Author's Affiliation LSI Basic Research Lab., Microelectronics Res. Labs, NEC Corporation()
Date 1997/4/18
Paper # EMD97-4
Volume (vol) vol.97
Number (no) 12
Page pp.pp.-
#Pages 6
Date of Issue