| Presentation | 1997/4/18 Fabrication of LIGA Mask Based on a Silicon IC-Process Kenichiro Suzuki, |
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| PDF Download Page | PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | A well-defined x-ray mask which consists of a set of 10μm thick gold absorber patterns and a membrane with a low tensile stress is required for LIGA process. We have fabricated a LIGA mask by using a silicon IC-process, while paying a careful attention on dust and contamination problems occurred during the process. In the paper, polysilicon stress control and fabrication of gold absorber patterns with a high aspect ratio are described in details. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | LIGA process / X-ray mask / high-aspect-ratio pattern / Micromachining |
| Paper # | EMD97-4 |
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| Conference Information | |
| Committee | EMD |
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| Conference Date | 1997/4/18(1days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | |
| Chair | |
| Vice Chair | |
| Secretary | |
| Assistant | |
| Paper Information | |
| Registration To | Electromechanical Devices (EMD) |
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| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Fabrication of LIGA Mask Based on a Silicon IC-Process |
| Sub Title (in English) | |
| Keyword(1) | LIGA process |
| Keyword(2) | X-ray mask |
| Keyword(3) | high-aspect-ratio pattern |
| Keyword(4) | Micromachining |
| 1st Author's Name | Kenichiro Suzuki |
| 1st Author's Affiliation | LSI Basic Research Lab., Microelectronics Res. Labs, NEC Corporation() |
| Date | 1997/4/18 |
| Paper # | EMD97-4 |
| Volume (vol) | vol.97 |
| Number (no) | 12 |
| Page | pp.pp.- |
| #Pages | 6 |
| Date of Issue | |