Presentation 2002/1/9
Effect of Gate-Recess Structure on the High Frequency Performance of Ultra-Fast InP-Based HEMTs : Asymmetric Gate-Recess Fabrication and Characterization
Keisuke SHINOHARA, Toshiaki MATSUI, Yoshimi YAMASHITA, Akira ENDOH, Kohki HIKOSAKA, Takashi MIMURA, Satoshi HIYAMIZU,
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Abstract(in English) InP-based InGaAs/InAlAs high electron mobility transistors (HEMTs) are the fastest transistors at present and key devices for the future millimeter-wave and optical communications. In this paper, a self-aligned asymmetric gate-recess structure for the ultra-fast InGaAs/InAlAs HEMTs is developed in order to investigate the effect of the gate-recess structure on their high frequency performances. A 60-nm-gate HEMT with a longer drain-side recess length (Lrd) exhibits a much-improved maximum oscillation frequency (fmax) of 503 GHz compared to that (281GHz) with a symmetric recess structure mainly due to a decrease in a drain conductance (gd) and a gate-drain capacitance (Cgd). This result indicates that the longer Lrd results in a longer depletion area at the drain end of the gate and then alleviate electric field between gate and drain.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) InP-HEMT / Asymmetric gate-recess / Cutoff frequency / ft / Maximum oscillation frequcency / fmax
Paper # 2001-ED-195,2001-MW-150,2001-ICD-192
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Committee MW
Conference Date 2002/1/9(1days)
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Registration To Microwaves (MW)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Effect of Gate-Recess Structure on the High Frequency Performance of Ultra-Fast InP-Based HEMTs : Asymmetric Gate-Recess Fabrication and Characterization
Sub Title (in English)
Keyword(1) InP-HEMT
Keyword(2) Asymmetric gate-recess
Keyword(3) Cutoff frequency
Keyword(4) ft
Keyword(5) Maximum oscillation frequcency
Keyword(6) fmax
1st Author's Name Keisuke SHINOHARA
1st Author's Affiliation Communications Research Laboratory()
2nd Author's Name Toshiaki MATSUI
2nd Author's Affiliation Communications Research Laboratory
3rd Author's Name Yoshimi YAMASHITA
3rd Author's Affiliation Fujitsu Limited
4th Author's Name Akira ENDOH
4th Author's Affiliation Fujitsu Limited
5th Author's Name Kohki HIKOSAKA
5th Author's Affiliation Fujitsu Limited
6th Author's Name Takashi MIMURA
6th Author's Affiliation Fujitsu Limited
7th Author's Name Satoshi HIYAMIZU
7th Author's Affiliation Graduate School of Engineering Science, Osaka University
Date 2002/1/9
Paper # 2001-ED-195,2001-MW-150,2001-ICD-192
Volume (vol) vol.101
Number (no) 552
Page pp.pp.-
#Pages 6
Date of Issue