Presentation 2000/10/13
Evaluation of Image Contrast in Scanning Near-field Millimeter-wave Microscope with a Slit-type probe
Tetze Hamano, Shuji Nuimura, Fumio Watanabe, Tatsuo Nozokido, Jongsuck Bae, Koji Mizuno,
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Abstract(in Japanese) (See Japanese page)
Abstract(in English) Scanning near-field microscopy in the millimeter wave region is applicable to non-destructive test of a material, in high spatial resolution much smaller than the wavelength. In our scanning near-field microscope system, the reflection coefficients of object provide its image contrast. Consequently, the material constant of object, which actively determines the reflection coefficients, such as relative dielectric constant, can be evaluated from the image contrast quantity. The following two points for the quantification evaluation are presented in this paper : 1) the improvement of the microscopy system in order to reduce the remarkable "noise" caused by any planar objects, and 2) the development of equivalent circuit of our microscope system having a slit-type probe. Applying a hemisphere-shaped or a higher tanδ material base under an object reduced the fluctuation of the measured data from more than 10% down to less than 5%, and the calculation data by the daveloped equivalent circuit was comparable to the measurement ones.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) millimeter waves / scanning near-field microscope / slit-type probe / surface wave propagation
Paper # EMCJ2000-77,MW2000-121
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Committee MW
Conference Date 2000/10/13(1days)
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Registration To Microwaves (MW)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Evaluation of Image Contrast in Scanning Near-field Millimeter-wave Microscope with a Slit-type probe
Sub Title (in English)
Keyword(1) millimeter waves
Keyword(2) scanning near-field microscope
Keyword(3) slit-type probe
Keyword(4) surface wave propagation
1st Author's Name Tetze Hamano
1st Author's Affiliation Research Institute of Electrical Communication, Tohoku University()
2nd Author's Name Shuji Nuimura
2nd Author's Affiliation Research Institute of Electrical Communication, Tohoku University
3rd Author's Name Fumio Watanabe
3rd Author's Affiliation Research Institute of Electrical Communication, Tohoku University
4th Author's Name Tatsuo Nozokido
4th Author's Affiliation Research Institute of Electrical Communication, Tohoku University
5th Author's Name Jongsuck Bae
5th Author's Affiliation Research Institute of Electrical Communication, Tohoku University
6th Author's Name Koji Mizuno
6th Author's Affiliation Research Institute of Electrical Communication, Tohoku University
Date 2000/10/13
Paper # EMCJ2000-77,MW2000-121
Volume (vol) vol.100
Number (no) 366
Page pp.pp.-
#Pages 6
Date of Issue