Presentation 1997/6/13
Fabrication of Polymer Integrated Photonic Circuits
Shunsuke Takahashi, Kenichi fujii, Kozo Taguchi, Masahiro Ikeda,
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Abstract(in Japanese) (See Japanese page)
Abstract(in English) Fabrication technology using dry etching and photo lithography for large scale photonic integrated circuits using polymer material is reported. PMMA and Polyimide are used for the waveguide material. The input/output end was formed by using dry etching process instead of the conventional cleaving or dicing. Both of PMMA and Polyimide are verified to be used as materials for large scale photonic integrated circuits.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) Photonic Integrated Circuits / Polymer / Dry Etching / Photo Lithography
Paper # MW97-41
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Conference Date 1997/6/13(1days)
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Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Fabrication of Polymer Integrated Photonic Circuits
Sub Title (in English)
Keyword(1) Photonic Integrated Circuits
Keyword(2) Polymer
Keyword(3) Dry Etching
Keyword(4) Photo Lithography
1st Author's Name Shunsuke Takahashi
1st Author's Affiliation Department of Electronics and Electrical Engineering, Fukuyama University()
2nd Author's Name Kenichi fujii
2nd Author's Affiliation Department of Electronics and Electrical Engineering, Fukuyama University
3rd Author's Name Kozo Taguchi
3rd Author's Affiliation Department of Electronics and Electrical Engineering, Fukuyama University
4th Author's Name Masahiro Ikeda
4th Author's Affiliation Department of Electronics and Electrical Engineering, Fukuyama University
Date 1997/6/13
Paper # MW97-41
Volume (vol) vol.97
Number (no) 94
Page pp.pp.-
#Pages 6
Date of Issue